Reference Type | Journal (article/letter/editorial) |
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Title | Interfacial capacitance between a ferroelectric Fe3O4 thin film and a semiconducting Nb:SrTiO3 substrate |
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Journal | Journal of Applied Physics |
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Authors | Takahashi, R. | Author |
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Cho, Y. | Author |
Lippmaa, M. | Author |
Year | 2015 (January 7) | Volume | 117 |
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Issue | 1 |
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Publisher | AIP Publishing |
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DOI | doi:10.1063/1.4905384Search in ResearchGate |
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| Generate Citation Formats |
Mindat Ref. ID | 5200505 | Long-form Identifier | mindat:1:5:5200505:3 |
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GUID | 0 |
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Full Reference | Takahashi, R., Cho, Y., Lippmaa, M. (2015) Interfacial capacitance between a ferroelectric Fe3O4 thin film and a semiconducting Nb:SrTiO3 substrate. Journal of Applied Physics, 117 (1). 14104pp. doi:10.1063/1.4905384 |
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Plain Text | Takahashi, R., Cho, Y., Lippmaa, M. (2015) Interfacial capacitance between a ferroelectric Fe3O4 thin film and a semiconducting Nb:SrTiO3 substrate. Journal of Applied Physics, 117 (1). 14104pp. doi:10.1063/1.4905384 |
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In | (2015, January) Journal of Applied Physics Vol. 117 (1) AIP Publishing |
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