Reference Type | Journal (article/letter/editorial) |
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Title | Coalescence-controlled and coalescence-free growth regimes during deposition of pulsed metal vapor fluxes on insulating surfaces |
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Journal | Journal of Applied Physics |
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Authors | Lü, B. | Author |
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Münger, E. P. | Author |
Sarakinos, K. | Author |
Year | 2015 (April 7) | Volume | 117 |
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Issue | 13 |
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Publisher | AIP Publishing |
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DOI | doi:10.1063/1.4916983Search in ResearchGate |
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| Generate Citation Formats |
Mindat Ref. ID | 5200806 | Long-form Identifier | mindat:1:5:5200806:9 |
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GUID | 0 |
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Full Reference | Lü, B., Münger, E. P., Sarakinos, K. (2015) Coalescence-controlled and coalescence-free growth regimes during deposition of pulsed metal vapor fluxes on insulating surfaces. Journal of Applied Physics, 117 (13). 134304pp. doi:10.1063/1.4916983 |
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Plain Text | Lü, B., Münger, E. P., Sarakinos, K. (2015) Coalescence-controlled and coalescence-free growth regimes during deposition of pulsed metal vapor fluxes on insulating surfaces. Journal of Applied Physics, 117 (13). 134304pp. doi:10.1063/1.4916983 |
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In | (2015, April) Journal of Applied Physics Vol. 117 (13) AIP Publishing |
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