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Yaish, Y. E., Calahorra, Y., Shtempluck, O., Kotchetkov, V. (2015) Three-point bending analysis of doubly clamped silicon nanowire beams; Young's modulus, initial stress, and crystal orientation. Journal of Applied Physics, 117 (16). 164311pp. doi:10.1063/1.4919017

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Reference TypeJournal (article/letter/editorial)
TitleThree-point bending analysis of doubly clamped silicon nanowire beams; Young's modulus, initial stress, and crystal orientation
JournalJournal of Applied Physics
AuthorsYaish, Y. E.Author
Calahorra, Y.Author
Shtempluck, O.Author
Kotchetkov, V.Author
Year2015 (April 28)Volume117
Issue16
PublisherAIP Publishing
DOIdoi:10.1063/1.4919017Search in ResearchGate
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Mindat Ref. ID5200956Long-form Identifiermindat:1:5:5200956:3
GUID0
Full ReferenceYaish, Y. E., Calahorra, Y., Shtempluck, O., Kotchetkov, V. (2015) Three-point bending analysis of doubly clamped silicon nanowire beams; Young's modulus, initial stress, and crystal orientation. Journal of Applied Physics, 117 (16). 164311pp. doi:10.1063/1.4919017
Plain TextYaish, Y. E., Calahorra, Y., Shtempluck, O., Kotchetkov, V. (2015) Three-point bending analysis of doubly clamped silicon nanowire beams; Young's modulus, initial stress, and crystal orientation. Journal of Applied Physics, 117 (16). 164311pp. doi:10.1063/1.4919017
In(2015, April) Journal of Applied Physics Vol. 117 (16) AIP Publishing

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