Reference Type | Journal (article/letter/editorial) |
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Title | Dose-dependent high-resolution electron ptychography |
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Journal | Journal of Applied Physics |
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Authors | D'Alfonso, A. J. | Author |
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Allen, L. J. | Author |
Sawada, H. | Author |
Kirkland, A. I. | Author |
Year | 2016 (February 7) | Volume | 119 |
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Issue | 5 |
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Publisher | AIP Publishing |
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DOI | doi:10.1063/1.4941269Search in ResearchGate |
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| Generate Citation Formats |
Mindat Ref. ID | 5204844 | Long-form Identifier | mindat:1:5:5204844:7 |
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GUID | 0 |
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Full Reference | D'Alfonso, A. J., Allen, L. J., Sawada, H., Kirkland, A. I. (2016) Dose-dependent high-resolution electron ptychography. Journal of Applied Physics, 119 (5). 54302pp. doi:10.1063/1.4941269 |
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Plain Text | D'Alfonso, A. J., Allen, L. J., Sawada, H., Kirkland, A. I. (2016) Dose-dependent high-resolution electron ptychography. Journal of Applied Physics, 119 (5). 54302pp. doi:10.1063/1.4941269 |
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In | (2016, February) Journal of Applied Physics Vol. 119 (5) AIP Publishing |
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