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Kılıç, Ufuk, Sekora, Derek, Mock, Alyssa, Korlacki, Rafał, Valloppilly, Shah, Echeverría, Elena M., Ianno, Natale, Schubert, Eva, Schubert, Mathias (2018) Critical-point model dielectric function analysis of WO3 thin films deposited by atomic layer deposition techniques. Journal of Applied Physics, 124 (11). 115302pp. doi:10.1063/1.5038746

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Reference TypeJournal (article/letter/editorial)
TitleCritical-point model dielectric function analysis of WO3 thin films deposited by atomic layer deposition techniques
JournalJournal of Applied Physics
AuthorsKılıç, UfukAuthor
Sekora, DerekAuthor
Mock, AlyssaAuthor
Korlacki, RafałAuthor
Valloppilly, ShahAuthor
Echeverría, Elena M.Author
Ianno, NataleAuthor
Schubert, EvaAuthor
Schubert, MathiasAuthor
Year2018 (September 21)Volume124
Issue11
PublisherAIP Publishing
DOIdoi:10.1063/1.5038746Search in ResearchGate
Generate Citation Formats
Mindat Ref. ID5209712Long-form Identifiermindat:1:5:5209712:4
GUID0
Full ReferenceKılıç, Ufuk, Sekora, Derek, Mock, Alyssa, Korlacki, Rafał, Valloppilly, Shah, Echeverría, Elena M., Ianno, Natale, Schubert, Eva, Schubert, Mathias (2018) Critical-point model dielectric function analysis of WO3 thin films deposited by atomic layer deposition techniques. Journal of Applied Physics, 124 (11). 115302pp. doi:10.1063/1.5038746
Plain TextKılıç, Ufuk, Sekora, Derek, Mock, Alyssa, Korlacki, Rafał, Valloppilly, Shah, Echeverría, Elena M., Ianno, Natale, Schubert, Eva, Schubert, Mathias (2018) Critical-point model dielectric function analysis of WO3 thin films deposited by atomic layer deposition techniques. Journal of Applied Physics, 124 (11). 115302pp. doi:10.1063/1.5038746
In(2018, September) Journal of Applied Physics Vol. 124 (11) AIP Publishing

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