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Shibayama, Shigehisa, Nishimura, Tomonori, Migita, Shinji, Toriumi, Akira (2018) Thermodynamic control of ferroelectric-phase formation in HfxZr1−xO2 and ZrO2. Journal of Applied Physics, 124 (18). 184101pp. doi:10.1063/1.5028181

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Reference TypeJournal (article/letter/editorial)
TitleThermodynamic control of ferroelectric-phase formation in HfxZr1−xO2 and ZrO2
JournalJournal of Applied Physics
AuthorsShibayama, ShigehisaAuthor
Nishimura, TomonoriAuthor
Migita, ShinjiAuthor
Toriumi, AkiraAuthor
Year2018 (November 14)Volume124
Issue18
PublisherAIP Publishing
DOIdoi:10.1063/1.5028181Search in ResearchGate
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Mindat Ref. ID5210052Long-form Identifiermindat:1:5:5210052:5
GUID0
Full ReferenceShibayama, Shigehisa, Nishimura, Tomonori, Migita, Shinji, Toriumi, Akira (2018) Thermodynamic control of ferroelectric-phase formation in HfxZr1−xO2 and ZrO2. Journal of Applied Physics, 124 (18). 184101pp. doi:10.1063/1.5028181
Plain TextShibayama, Shigehisa, Nishimura, Tomonori, Migita, Shinji, Toriumi, Akira (2018) Thermodynamic control of ferroelectric-phase formation in HfxZr1−xO2 and ZrO2. Journal of Applied Physics, 124 (18). 184101pp. doi:10.1063/1.5028181
In(2018, November) Journal of Applied Physics Vol. 124 (18) AIP Publishing

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Xu, Lun, Nishimura, Tomonori, Shibayama, Shigehisa, Yajima, Takeaki, Migita, Shinji, Toriumi, Akira (2017) Kinetic pathway of the ferroelectric phase formation in doped HfO2 films. Journal of Applied Physics, 122 (12). 124104pp. doi:10.1063/1.5003918
Tian, Xuan, Shibayama, Shigehisa, Nishimura, Tomonori, Yajima, Takeaki, Migita, Shinji, Toriumi, Akira (2018) Evolution of ferroelectric HfO2 in ultrathin region down to 3 nm. Applied Physics Letters, 112 (10). 102902pp. doi:10.1063/1.5017094
Nishimura, Tomonori, Xu, Lun, Shibayama, Shigehisa, Yajima, Takeaki, Migita, Shinji, Toriumi, Akira (2016) Ferroelectricity of nondoped thin HfO2films in TiN/HfO2/TiN stacks. Japanese Journal of Applied Physics, 55 (8) 8 doi:10.7567/jjap.55.08pb01
Yajima, T., Nishimura, T., Migita, S., Tanaka, T., Uchida, K., Toriumi, A. (2020) Regulating phase transformation kinetics via redox reaction in ferroelectric Ge-doped HfO2. Applied Physics Letters, 117 (18) 182902pp. doi:10.1063/5.0028620
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Shibayama, Shigehisa, Nagano, Jotaro, Sakashita, Mitsuo, Nakatsuka, Osamu (2020) Ferroelectric phase formation for undoped ZrO2 thin films by wet O2 annealing. Japanese Journal of Applied Physics, 59. doi:10.35848/1347-4065/ab80de
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