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Petrov, Ivan (1994) Lattice-stabilized CH3, C2H5, NO2, and O1- radicals in feldspar with different Al-Si order. American Mineralogist, 79 (3-4) 221-239

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Reference TypeJournal (article/letter/editorial)
TitleLattice-stabilized CH3, C2H5, NO2, and O1- radicals in feldspar with different Al-Si order
JournalAmerican Mineralogist
AuthorsPetrov, IvanAuthor
Year1994Volume79
Issue3-4
PublisherMineralogical Society of America
Download URLhttp://www.minsocam.org/ammin/AM79/AM79_221.pdf+
Mindat Ref. ID529611Long-form Identifiermindat:1:5:529611:2
GUID0
Full ReferencePetrov, Ivan (1994) Lattice-stabilized CH3, C2H5, NO2, and O1- radicals in feldspar with different Al-Si order. American Mineralogist, 79 (3-4) 221-239
Plain TextPetrov, Ivan (1994) Lattice-stabilized CH3, C2H5, NO2, and O1- radicals in feldspar with different Al-Si order. American Mineralogist, 79 (3-4) 221-239
In(1994) American Mineralogist Vol. 79 (3-4) Mineralogical Society of America


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