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Jauberteau, J.L, Jauberteau, I, Aubreton, J (2004) Argon clusters produced in a nozzle beam at low pressure: Ar2 ionisation cross-section measurement. International Journal of Mass Spectrometry, 235 (2). 179-186 doi:10.1016/j.ijms.2004.05.001

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Reference TypeJournal (article/letter/editorial)
TitleArgon clusters produced in a nozzle beam at low pressure: Ar2 ionisation cross-section measurement
JournalInternational Journal of Mass Spectrometry
AuthorsJauberteau, J.LAuthor
Jauberteau, IAuthor
Aubreton, JAuthor
Year2004 (July)Volume235
Issue2
PublisherElsevier BV
DOIdoi:10.1016/j.ijms.2004.05.001Search in ResearchGate
Generate Citation Formats
Mindat Ref. ID5364182Long-form Identifiermindat:1:5:5364182:5
GUID0
Full ReferenceJauberteau, J.L, Jauberteau, I, Aubreton, J (2004) Argon clusters produced in a nozzle beam at low pressure: Ar2 ionisation cross-section measurement. International Journal of Mass Spectrometry, 235 (2). 179-186 doi:10.1016/j.ijms.2004.05.001
Plain TextJauberteau, J.L, Jauberteau, I, Aubreton, J (2004) Argon clusters produced in a nozzle beam at low pressure: Ar2 ionisation cross-section measurement. International Journal of Mass Spectrometry, 235 (2). 179-186 doi:10.1016/j.ijms.2004.05.001
In(2004, July) International Journal of Mass Spectrometry Vol. 235 (2) Elsevier BV

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Jauberteau, J.L., Jauberteau, I., Aubreton, J. (2007) Mass spectrometer analysis of plasma containing easily dissociated species: Absolute concentrations of the main free radicals Si(CH3)1,2,3, and H2Si(CH3) produced in a microwave discharge sustained in an Ar–Si(CH3)4 gas mixture. International Journal of Mass Spectrometry, 266 (1). 15-24 doi:10.1016/j.ijms.2007.06.009
Jauberteau, J.L., Aubreton, J., Jauberteau, I. (1999) Characterization of an Ar-TMS microwave discharge using mass spectrometry: effect of the reactor design on free-radical contents. International Journal of Mass Spectrometry, 189 (1). 63-77 doi:10.1016/s1387-3806(99)00059-7
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Jauberteau, J.L., Jauberteau, I. (2014) Ionization cross section of radicals produced by hexamethyldisiloxane dissociation. Chemical Physics Letters, 604. 116-121 doi:10.1016/j.cplett.2014.04.044
Jauberteau, J.L., Jauberteau, I., Aubreton, J. (2000) Reaction rate constant for Ar( P2) metastable atoms with the tetramethylsilane molecule. Chemical Physics Letters, 327. 351-358 doi:10.1016/s0009-2614(00)00854-x
Jauberteau, J L, Jauberteau, I, Cinelli, M J, Aubreton, J (2002) Reactivity of methane in a nitrogen discharge afterglow. New Journal of Physics, 4. 39 doi:10.1088/1367-2630/4/1/339
Aubreton, J, Conte, D, Jauberteau, J L, Jauberteau, I (2000) Measurement of rate constants between atomic nitrogen and silane in a nitrogen discharge afterglow. Journal of Physics D: Applied Physics, 33. 1499-1506 doi:10.1088/0022-3727/33/12/312
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Thomas, L., Jauberteau, I., Jauberteau, J. L., Cinelli, M. J., Aubreton, J., Catherinot, A. (1996) Initial stages in the growth of carbon films produced in an Ar–CH4–H2 microwave discharge: Composition and surface layers morphology. Applied Physics Letters, 68 (12). 1634-1636 doi:10.1063/1.115675
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