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Law, K.P. (2010) Surface-assisted laser desorption/ionization mass spectrometry on nanostructured silicon substrates prepared by iodine-assisted etching. International Journal of Mass Spectrometry, 290 (1). 47-59 doi:10.1016/j.ijms.2009.12.003

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Reference TypeJournal (article/letter/editorial)
TitleSurface-assisted laser desorption/ionization mass spectrometry on nanostructured silicon substrates prepared by iodine-assisted etching
JournalInternational Journal of Mass Spectrometry
AuthorsLaw, K.P.Author
Year2010 (February)Volume290
Issue1
PublisherElsevier BV
DOIdoi:10.1016/j.ijms.2009.12.003Search in ResearchGate
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Mindat Ref. ID5368105Long-form Identifiermindat:1:5:5368105:4
GUID0
Full ReferenceLaw, K.P. (2010) Surface-assisted laser desorption/ionization mass spectrometry on nanostructured silicon substrates prepared by iodine-assisted etching. International Journal of Mass Spectrometry, 290 (1). 47-59 doi:10.1016/j.ijms.2009.12.003
Plain TextLaw, K.P. (2010) Surface-assisted laser desorption/ionization mass spectrometry on nanostructured silicon substrates prepared by iodine-assisted etching. International Journal of Mass Spectrometry, 290 (1). 47-59 doi:10.1016/j.ijms.2009.12.003
In(2010, February) International Journal of Mass Spectrometry Vol. 290 (1) Elsevier BV

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