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Simpson, S W, Seebacher, P J, Messerle, H K (1987) Study of a continuous plasma centrifuge. Journal of Physics D: Applied Physics, 20. 622-628 doi:10.1088/0022-3727/20/5/009

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Reference TypeJournal (article/letter/editorial)
TitleStudy of a continuous plasma centrifuge
JournalJournal of Physics D: Applied Physics
AuthorsSimpson, S WAuthor
Seebacher, P JAuthor
Messerle, H KAuthor
Year1987 (May 14)Volume20
PublisherIOP Publishing
DOIdoi:10.1088/0022-3727/20/5/009Search in ResearchGate
Generate Citation Formats
Mindat Ref. ID5662956Long-form Identifiermindat:1:5:5662956:9
GUID0
Full ReferenceSimpson, S W, Seebacher, P J, Messerle, H K (1987) Study of a continuous plasma centrifuge. Journal of Physics D: Applied Physics, 20. 622-628 doi:10.1088/0022-3727/20/5/009
Plain TextSimpson, S W, Seebacher, P J, Messerle, H K (1987) Study of a continuous plasma centrifuge. Journal of Physics D: Applied Physics, 20. 622-628 doi:10.1088/0022-3727/20/5/009
In(1987) Journal of Physics D: Applied Physics Vol. 20. IOP Publishing

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Simpson, S W, Law, S H (1989) Unsteady behaviour of a continuous plasma centrifuge. Journal of Physics D: Applied Physics, 22. 229-232 doi:10.1088/0022-3727/22/1/034
Simpson, S W (1987) Ionisation instability in a rotating plasma. Journal of Physics D: Applied Physics, 20. 1008-1015 doi:10.1088/0022-3727/20/8/004
Hole, M J, Simpson, S W (2001) Analytical description of a collisional plasma column in a vacuum arc centrifuge. Journal of Physics D: Applied Physics, 34. 3028-3035 doi:10.1088/0022-3727/34/20/305
Kazantsev, S A, Subbotenko, A V (1987) Polarisation spectroscopy of a high-frequency discharge plasma. Journal of Physics D: Applied Physics, 20. 741-753 doi:10.1088/0022-3727/20/6/009
Barreto, P R P, Bosco, E Del, Simpson, S W (1999) Arc rotation measurement in a low-power plasma torch. Journal of Physics D: Applied Physics, 32. 2630-2635 doi:10.1088/0022-3727/32/20/308
Sola, A, Cotrino, J, Gamero, A, Colomer, V (1987) Study of surface-wave-produced plasma column lengths. Journal of Physics D: Applied Physics, 20. 1250-1258 doi:10.1088/0022-3727/20/10/007
Smy, P R, Clements, R M, Oppenheim, A K, Topham, D R (1987) Structure of the pulsed plasma jet. Journal of Physics D: Applied Physics, 20. 1016-1020 doi:10.1088/0022-3727/20/8/005
Park, S C, Stansfield, R A, Clary, D C (1987) Sputtering of a Cu solid by SiCl4molecules. Journal of Physics D: Applied Physics, 20. 880-888 doi:10.1088/0022-3727/20/7/009
Pelletier, J (1987) A model for the halogen-based plasma etching of silicon. Journal of Physics D: Applied Physics, 20. 858-869 doi:10.1088/0022-3727/20/7/007
Papadopoulos, S (1987) A study of the liquid Pr-ion source. Journal of Physics D: Applied Physics, 20. 1302-1313 doi:10.1088/0022-3727/20/10/014
Dutton, J, Goodings, A, Lucas, A K, Williams, A W (1987) Electron attachment in tetrafluoromethane. Journal of Physics D: Applied Physics, 20. 1322-1323 doi:10.1088/0022-3727/20/10/018
 
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