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Rottmann, M, Heckner, K -H (1995) Electrical and structural properties of indium tin oxide films deposited by reactive DC sputtering. Journal of Physics D: Applied Physics, 28. 1448-1453 doi:10.1088/0022-3727/28/7/024

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Reference TypeJournal (article/letter/editorial)
TitleElectrical and structural properties of indium tin oxide films deposited by reactive DC sputtering
JournalJournal of Physics D: Applied Physics
AuthorsRottmann, MAuthor
Heckner, K -HAuthor
Year1995 (July 14)Volume28
PublisherIOP Publishing
DOIdoi:10.1088/0022-3727/28/7/024Search in ResearchGate
Generate Citation Formats
Mindat Ref. ID5665909Long-form Identifiermindat:1:5:5665909:2
GUID0
Full ReferenceRottmann, M, Heckner, K -H (1995) Electrical and structural properties of indium tin oxide films deposited by reactive DC sputtering. Journal of Physics D: Applied Physics, 28. 1448-1453 doi:10.1088/0022-3727/28/7/024
Plain TextRottmann, M, Heckner, K -H (1995) Electrical and structural properties of indium tin oxide films deposited by reactive DC sputtering. Journal of Physics D: Applied Physics, 28. 1448-1453 doi:10.1088/0022-3727/28/7/024
In(1995) Journal of Physics D: Applied Physics Vol. 28. IOP Publishing

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Zhang, D H (1995) Fast photoresponse and the related change of crystallite barriers for ZnO films deposited by RF sputtering. Journal of Physics D: Applied Physics, 28. 1273-1277 doi:10.1088/0022-3727/28/6/034
Cevro, M, Carter, G (1995) Ion beam sputtering and dual ion beam sputtering of titanium oxide films. Journal of Physics D: Applied Physics, 28. 1962-1976 doi:10.1088/0022-3727/28/9/026
Czternastek, H, Brudnik, A, Jachimowski, M, Kolawa, E (1992) Voltage-controlled DC reactive magnetron sputtering of indium-doped zinc oxide films. Journal of Physics D: Applied Physics, 25. 865-870 doi:10.1088/0022-3727/25/5/019
Bhaumik, Suchandra, Mondal, Parthasarathi, Barua, A K (2006) The influence of hydrogen gas in the ambient gas mixture on the properties of indium tin oxide films deposited on glass and acrylic substrates by dc magnetron sputtering. Journal of Physics D: Applied Physics, 39. 3838-3843 doi:10.1088/0022-3727/39/17/020
Song, Pung Keun, Shigesato, Yuzo, Kamei, Masayuki, Yasui, Itaru (1999) Electrical and Structural Properties of Tin-Doped Indium Oxide Films Deposited by DC Sputtering at Room Temperature. Japanese Journal of Applied Physics, 38. 2921-2927 doi:10.1143/jjap.38.2921
Manivannan, P, Subrahmanyam, A (1993) Studies on the electrical and optical properties of reactive electron beam evaporated indium tin oxide films. Journal of Physics D: Applied Physics, 26. 1510-1515 doi:10.1088/0022-3727/26/9/027
Sundaram, K B, Bhagavat, G K (1981) Chemical vapour deposition of tin oxide films and their electrical properties. Journal of Physics D: Applied Physics, 14. 333-338 doi:10.1088/0022-3727/14/2/024
Zerkout, S, Achour, S, Tabet, N (2007) TiN–Fe nanocomposite thin films deposited by reactive magnetron sputtering. Journal of Physics D: Applied Physics, 40. 7508-7514 doi:10.1088/0022-3727/40/23/039
Muthu Karuppasamy, K, Subrahmanyam, A (2008) Results on the electrochromic and photocatalytic properties of vanadium doped tungsten oxide thin films prepared by reactive dc magnetron sputtering technique. Journal of Physics D: Applied Physics, 41. 35302pp. doi:10.1088/0022-3727/41/3/035302
Soliman, H S (1995) Optical properties of AgGaSe2polycrystalline films prepared by flash evaporation. Journal of Physics D: Applied Physics, 28. 764-769 doi:10.1088/0022-3727/28/4/021
Köhl, D, Luysberg, M, Wuttig, M (2010) Structural improvement of zinc oxide films produced by ion beam assisted reactive sputtering. Journal of Physics D: Applied Physics, 43. 205301pp. doi:10.1088/0022-3727/43/20/205301
 
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