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Gupta, Dhanoj, Choi, Heechol, Kwon, Deuk-Chul, Yoon, Jung-Sik, Song, Mi-Young (2018) Electron induced ionization of plasma processing gases: C4Fx(x  =  1–8) and the isomers of C4F6and C4F8. Journal of Physics D: Applied Physics, 51. 155203pp. doi:10.1088/1361-6463/aab1e3

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Reference TypeJournal (article/letter/editorial)
TitleElectron induced ionization of plasma processing gases: C4Fx(x  =  1–8) and the isomers of C4F6and C4F8
JournalJournal of Physics D: Applied Physics
AuthorsGupta, DhanojAuthor
Choi, HeecholAuthor
Kwon, Deuk-ChulAuthor
Yoon, Jung-SikAuthor
Song, Mi-YoungAuthor
Year2018 (April 18)Volume51
PublisherIOP Publishing
DOIdoi:10.1088/1361-6463/aab1e3Search in ResearchGate
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Mindat Ref. ID5691569Long-form Identifiermindat:1:5:5691569:7
GUID0
Full ReferenceGupta, Dhanoj, Choi, Heechol, Kwon, Deuk-Chul, Yoon, Jung-Sik, Song, Mi-Young (2018) Electron induced ionization of plasma processing gases: C4Fx(x  =  1–8) and the isomers of C4F6and C4F8. Journal of Physics D: Applied Physics, 51. 155203pp. doi:10.1088/1361-6463/aab1e3
Plain TextGupta, Dhanoj, Choi, Heechol, Kwon, Deuk-Chul, Yoon, Jung-Sik, Song, Mi-Young (2018) Electron induced ionization of plasma processing gases: C4Fx(x  =  1–8) and the isomers of C4F6and C4F8. Journal of Physics D: Applied Physics, 51. 155203pp. doi:10.1088/1361-6463/aab1e3
In(2015) Journal of Physics D: Applied Physics Vol. 51. IOP Publishing

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