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Xi-Jie, Dong, Yi-Fan, Hu, Yu-Ying, Wu (2010) Positronium diffusion in porous methylsilsesquioxane thin films. Chinese Physics B, 19. 13601-8 doi:10.1088/1674-1056/19/1/013601

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Reference TypeJournal (article/letter/editorial)
TitlePositronium diffusion in porous methylsilsesquioxane thin films
JournalChinese Physics B
AuthorsXi-Jie, DongAuthor
Yi-Fan, HuAuthor
Yu-Ying, WuAuthor
Year2010 (January)Volume19
PublisherIOP Publishing
DOIdoi:10.1088/1674-1056/19/1/013601Search in ResearchGate
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Mindat Ref. ID5999623Long-form Identifiermindat:1:5:5999623:1
GUID0
Full ReferenceXi-Jie, Dong, Yi-Fan, Hu, Yu-Ying, Wu (2010) Positronium diffusion in porous methylsilsesquioxane thin films. Chinese Physics B, 19. 13601-8 doi:10.1088/1674-1056/19/1/013601
Plain TextXi-Jie, Dong, Yi-Fan, Hu, Yu-Ying, Wu (2010) Positronium diffusion in porous methylsilsesquioxane thin films. Chinese Physics B, 19. 13601-8 doi:10.1088/1674-1056/19/1/013601
In(n.d.) Chinese Physics B Vol. 19. IOP Publishing

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