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Jian, Chen, Qing-Kang, Wang, Hai-Hua, Li (2010) Far-field superlens for nanolithography. Chinese Physics B, 19. 34202pp. doi:10.1088/1674-1056/19/3/034202

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Reference TypeJournal (article/letter/editorial)
TitleFar-field superlens for nanolithography
JournalChinese Physics B
AuthorsJian, ChenAuthor
Qing-Kang, WangAuthor
Hai-Hua, LiAuthor
Year2010 (March)Volume19
PublisherIOP Publishing
DOIdoi:10.1088/1674-1056/19/3/034202Search in ResearchGate
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Mindat Ref. ID6000117Long-form Identifiermindat:1:5:6000117:7
GUID0
Full ReferenceJian, Chen, Qing-Kang, Wang, Hai-Hua, Li (2010) Far-field superlens for nanolithography. Chinese Physics B, 19. 34202pp. doi:10.1088/1674-1056/19/3/034202
Plain TextJian, Chen, Qing-Kang, Wang, Hai-Hua, Li (2010) Far-field superlens for nanolithography. Chinese Physics B, 19. 34202pp. doi:10.1088/1674-1056/19/3/034202
In(n.d.) Chinese Physics B Vol. 19. IOP Publishing

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