Reference Type | Journal (article/letter/editorial) |
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Title | Target voltage behaviour of a vanadium-oxide thin film during reactive magnetron sputtering |
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Journal | Chinese Physics B |
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Authors | Wang, Tao | Author |
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Jiang, Ya-Dong | Author |
Yu, He | Author |
Wu, Zhi-Ming | Author |
Zhao, He-Nan | Author |
Year | 2011 (March) | Volume | 20 |
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Publisher | IOP Publishing |
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DOI | doi:10.1088/1674-1056/20/3/038101Search in ResearchGate |
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| Generate Citation Formats |
Mindat Ref. ID | 6001279 | Long-form Identifier | mindat:1:5:6001279:3 |
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GUID | 0 |
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Full Reference | Wang, Tao, Jiang, Ya-Dong, Yu, He, Wu, Zhi-Ming, Zhao, He-Nan (2011) Target voltage behaviour of a vanadium-oxide thin film during reactive magnetron sputtering. Chinese Physics B, 20. 38101pp. doi:10.1088/1674-1056/20/3/038101 |
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Plain Text | Wang, Tao, Jiang, Ya-Dong, Yu, He, Wu, Zhi-Ming, Zhao, He-Nan (2011) Target voltage behaviour of a vanadium-oxide thin film during reactive magnetron sputtering. Chinese Physics B, 20. 38101pp. doi:10.1088/1674-1056/20/3/038101 |
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In | (n.d.) Chinese Physics B Vol. 20. IOP Publishing |
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