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Fan, Ji-Bin, Liu, Hong-Xia, Ma, Fei, Zhuo, Qing-Qing, Hao, Yue (2013) Influences of different oxidants on the characteristics of HfAlOxfilms deposited by atomic layer deposition. Chinese Physics B, 22. 27702pp. doi:10.1088/1674-1056/22/2/027702

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Reference TypeJournal (article/letter/editorial)
TitleInfluences of different oxidants on the characteristics of HfAlOxfilms deposited by atomic layer deposition
JournalChinese Physics B
AuthorsFan, Ji-BinAuthor
Liu, Hong-XiaAuthor
Ma, FeiAuthor
Zhuo, Qing-QingAuthor
Hao, YueAuthor
Year2013 (February)Volume22
PublisherIOP Publishing
DOIdoi:10.1088/1674-1056/22/2/027702Search in ResearchGate
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Mindat Ref. ID6003432Long-form Identifiermindat:1:5:6003432:4
GUID0
Full ReferenceFan, Ji-Bin, Liu, Hong-Xia, Ma, Fei, Zhuo, Qing-Qing, Hao, Yue (2013) Influences of different oxidants on the characteristics of HfAlOxfilms deposited by atomic layer deposition. Chinese Physics B, 22. 27702pp. doi:10.1088/1674-1056/22/2/027702
Plain TextFan, Ji-Bin, Liu, Hong-Xia, Ma, Fei, Zhuo, Qing-Qing, Hao, Yue (2013) Influences of different oxidants on the characteristics of HfAlOxfilms deposited by atomic layer deposition. Chinese Physics B, 22. 27702pp. doi:10.1088/1674-1056/22/2/027702
In(n.d.) Chinese Physics B Vol. 22. IOP Publishing

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Fan, Ji-Bin, Liu, Hong-Xia, Li, Duan, Zhang, Yan, Yu, Xiao-Chen (2017) Influences of different oxidants on characteristics of La${}_{2}$O${}_{3}$/Al${}_{2}$O${}_{3}$ nanolaminates deposited by atomic layer deposition. Chinese Physics B, 26. 67701pp. doi:10.1088/1674-1056/26/6/067701
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