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Liu, Xiang-Mei, Song, Yuan-Hong, Jiang, Wei, Yi, Lin (2013) The effects of process conditions on the plasma characteristic in radio-frequency capacitively coupled SiH4/NH3/N2plasmas: Two-dimensional simulations. Chinese Physics B, 22. 45204pp. doi:10.1088/1674-1056/22/4/045204

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Reference TypeJournal (article/letter/editorial)
TitleThe effects of process conditions on the plasma characteristic in radio-frequency capacitively coupled SiH4/NH3/N2plasmas: Two-dimensional simulations
JournalChinese Physics B
AuthorsLiu, Xiang-MeiAuthor
Song, Yuan-HongAuthor
Jiang, WeiAuthor
Yi, LinAuthor
Year2013 (April)Volume22
PublisherIOP Publishing
DOIdoi:10.1088/1674-1056/22/4/045204Search in ResearchGate
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Mindat Ref. ID6003598Long-form Identifiermindat:1:5:6003598:9
GUID0
Full ReferenceLiu, Xiang-Mei, Song, Yuan-Hong, Jiang, Wei, Yi, Lin (2013) The effects of process conditions on the plasma characteristic in radio-frequency capacitively coupled SiH4/NH3/N2plasmas: Two-dimensional simulations. Chinese Physics B, 22. 45204pp. doi:10.1088/1674-1056/22/4/045204
Plain TextLiu, Xiang-Mei, Song, Yuan-Hong, Jiang, Wei, Yi, Lin (2013) The effects of process conditions on the plasma characteristic in radio-frequency capacitively coupled SiH4/NH3/N2plasmas: Two-dimensional simulations. Chinese Physics B, 22. 45204pp. doi:10.1088/1674-1056/22/4/045204
In(n.d.) Chinese Physics B Vol. 22. IOP Publishing

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