Bai, Yang, Jia, Rui, Wu, De-Qi, Jin, Zhi, Liu, Xin-Yu, Lin, Mei-Yu (2013) Investigation of chlorine-based etchants in wet and dry etching technology for an InP planar Gunn diode. Chinese Physics B, 22. 87202pp. doi:10.1088/1674-1056/22/8/087202
Reference Type | Journal (article/letter/editorial) | ||
---|---|---|---|
Title | Investigation of chlorine-based etchants in wet and dry etching technology for an InP planar Gunn diode | ||
Journal | Chinese Physics B | ||
Authors | Bai, Yang | Author | |
Jia, Rui | Author | ||
Wu, De-Qi | Author | ||
Jin, Zhi | Author | ||
Liu, Xin-Yu | Author | ||
Lin, Mei-Yu | Author | ||
Year | 2013 (August) | Volume | 22 |
Publisher | IOP Publishing | ||
DOI | doi:10.1088/1674-1056/22/8/087202Search in ResearchGate | ||
Generate Citation Formats | |||
Mindat Ref. ID | 6004030 | Long-form Identifier | mindat:1:5:6004030:7 |
GUID | 0 | ||
Full Reference | Bai, Yang, Jia, Rui, Wu, De-Qi, Jin, Zhi, Liu, Xin-Yu, Lin, Mei-Yu (2013) Investigation of chlorine-based etchants in wet and dry etching technology for an InP planar Gunn diode. Chinese Physics B, 22. 87202pp. doi:10.1088/1674-1056/22/8/087202 | ||
Plain Text | Bai, Yang, Jia, Rui, Wu, De-Qi, Jin, Zhi, Liu, Xin-Yu, Lin, Mei-Yu (2013) Investigation of chlorine-based etchants in wet and dry etching technology for an InP planar Gunn diode. Chinese Physics B, 22. 87202pp. doi:10.1088/1674-1056/22/8/087202 | ||
In | (n.d.) Chinese Physics B Vol. 22. IOP Publishing |
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