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Stanowski, R., Dubowski, J. J. (2009) Laser rapid thermal annealing of quantum semiconductor wafers: a one step bandgap engineering technique. Applied Physics A, 94. 667-674 doi:10.1007/s00339-008-4955-7

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Reference TypeJournal (article/letter/editorial)
TitleLaser rapid thermal annealing of quantum semiconductor wafers: a one step bandgap engineering technique
JournalApplied Physics A
AuthorsStanowski, R.Author
Dubowski, J. J.Author
Year2009 (March)Volume94
PublisherSpringer Science and Business Media LLC
DOIdoi:10.1007/s00339-008-4955-7Search in ResearchGate
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Mindat Ref. ID6013764Long-form Identifiermindat:1:5:6013764:9
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Full ReferenceStanowski, R., Dubowski, J. J. (2009) Laser rapid thermal annealing of quantum semiconductor wafers: a one step bandgap engineering technique. Applied Physics A, 94. 667-674 doi:10.1007/s00339-008-4955-7
Plain TextStanowski, R., Dubowski, J. J. (2009) Laser rapid thermal annealing of quantum semiconductor wafers: a one step bandgap engineering technique. Applied Physics A, 94. 667-674 doi:10.1007/s00339-008-4955-7
In(2009) Applied Physics A Vol. 94. Springer Science and Business Media LLC

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