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Konashuk, A. S., Sokolov, A. A., Drozd, V. E., Romanov, A. A., Filatova, E. O. (2012) The influence of porous silica substrate on the properties of alumina films studied by X-ray reflection spectroscopy. Technical Physics Letters, 38. 562-564 doi:10.1134/s1063785012060235

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Reference TypeJournal (article/letter/editorial)
TitleThe influence of porous silica substrate on the properties of alumina films studied by X-ray reflection spectroscopy
JournalTechnical Physics Letters
AuthorsKonashuk, A. S.Author
Sokolov, A. A.Author
Drozd, V. E.Author
Romanov, A. A.Author
Filatova, E. O.Author
Year2012 (June)Volume38
PublisherPleiades Publishing Ltd
DOIdoi:10.1134/s1063785012060235Search in ResearchGate
Generate Citation Formats
Mindat Ref. ID6208003Long-form Identifiermindat:1:5:6208003:5
GUID0
Full ReferenceKonashuk, A. S., Sokolov, A. A., Drozd, V. E., Romanov, A. A., Filatova, E. O. (2012) The influence of porous silica substrate on the properties of alumina films studied by X-ray reflection spectroscopy. Technical Physics Letters, 38. 562-564 doi:10.1134/s1063785012060235
Plain TextKonashuk, A. S., Sokolov, A. A., Drozd, V. E., Romanov, A. A., Filatova, E. O. (2012) The influence of porous silica substrate on the properties of alumina films studied by X-ray reflection spectroscopy. Technical Physics Letters, 38. 562-564 doi:10.1134/s1063785012060235
In(n.d.) Technical Physics Letters Vol. 38. Pleiades Publishing Ltd

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Filatova, E. O., Sokolov, A. A., Taracheva, E. Yu., Bagrov, I. V. (2009) Studying natural oxide on the surface of n-Si(111), n-Si(100), and p-Si(111) single crystal wafers by X-ray reflection spectroscopy. Technical Physics Letters, 35. 70-72 doi:10.1134/s1063785009010210
Baraban, A. P., Dmitriev, V. A., Prokof’ev, V. A., Drozd, V. E., Filatova, E. O. (2016) Photoluminescence of Ta2O5 films formed by the molecular layer deposition method. Technical Physics Letters, 42. 341-343 doi:10.1134/s1063785016040040
Filatova, E. O., Sokolov, A. A., Egorova, Yu. V., Konashuk, A. S., Vilkov, O. Yu., Gorgoi, M., Pavlychev, A. A. (2013) X-ray spectroscopic study of SrTiOx films with different interlayers. Journal of Applied Physics, 113 (22). 224301pp. doi:10.1063/1.4809978
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Konyushenko, M. A., Filatova, E. O., Konashuk, A. S., Nelyubov, A. V., Shulakov, A. S. (2015) Experimental determination of the top of the valence band in amorphous Al2O3 and γ-Al2O3. Technical Physics Letters, 41. 922-925 doi:10.1134/s1063785015100077
Sokolov, A. A., Ovchinnikov, A. A., Lysenkov, K. M., Marchenko, D. E., Filatova, E. O. (2010) X-ray spectroscopic examination of thin HfO2 films ALD- and MOCVD-grown on the Si(100) surface. Technical Physics, 55 (7). 1045-1050 doi:10.1134/s1063784210070200
Filatova, E O, Baraban, A P, Konashuk, A S, Konyushenko, M A, Selivanov, A A, Sokolov, A A, Schaefers, F, Drozd, V E (2014) Transparent-conductive-oxide (TCO) buffer layer effect on the resistive switching process in metal/TiO2/TCO/metal assemblies. New Journal of Physics, 16. 113014pp. doi:10.1088/1367-2630/16/11/113014
Bugaev, A. V., Konashuk, A. S., Filatova, E. O. (2024) Formation of a Polar Ferroelectric Phase in HFO2 Films Depending on Annealing Conditions and Chemical Properties of Impurities. Crystallography Reports, 69 (1) 16-22 doi:10.1134/s1063774523601235
Filatova, E. O., Lysenkov, K. M., Sokolov, A. A., Ovchinnikov, A. A., Marchenko, D. E., Kashkarov, V. M., Nazarikov, I. V. (2010) Spectroscopic investigations of the stability of porous silicon structure obtained by etching Si(100) in aqueous ammonium fluoride solution. Technical Physics Letters, 36. 119-121 doi:10.1134/s1063785010020082
Baraban, A. P., Selivanov, A. A., Dmitriev, V. A., Drozd, A. V., Drozd, V. E. (2019) Cathodoluminescence of TiO2 Films Formed by Molecular Layer Deposition. Technical Physics Letters, 45. 256-258 doi:10.1134/s1063785019030210
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