Reference Type | Journal (article/letter/editorial) |
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Title | Current induced bunches of steps on the Si(111) surface – a key to measuring the temperature dependence of the step interaction coefficient |
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Journal | Surface Science |
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Authors | Stoyanov, S. | Author |
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Métois, J.J. | Author |
Tonchev, V. | Author |
Year | 2000 (October) | Volume | 465 |
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Issue | 3 |
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Publisher | Elsevier BV |
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DOI | doi:10.1016/s0039-6028(00)00652-xSearch in ResearchGate |
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| Generate Citation Formats |
Mindat Ref. ID | 6475105 | Long-form Identifier | mindat:1:5:6475105:8 |
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GUID | 0 |
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Full Reference | Stoyanov, S., Métois, J.J., Tonchev, V. (2000) Current induced bunches of steps on the Si(111) surface – a key to measuring the temperature dependence of the step interaction coefficient. Surface Science, 465 (3). 227-242 doi:10.1016/s0039-6028(00)00652-x |
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Plain Text | Stoyanov, S., Métois, J.J., Tonchev, V. (2000) Current induced bunches of steps on the Si(111) surface – a key to measuring the temperature dependence of the step interaction coefficient. Surface Science, 465 (3). 227-242 doi:10.1016/s0039-6028(00)00652-x |
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In | (2000, October) Surface Science Vol. 465 (3) Elsevier BV |
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