Reference Type | Journal (article/letter/editorial) |
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Title | Chemical Vapor Deposition. Principles and Applications. Herausgegeben vonM. L. Hitchman undK. F. Jensen. Academic Press, London, 1993. 677 S., geb. 75.00 £. - ISBN 0-12-349670-5 |
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Journal | Angewandte Chemie |
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Authors | Fischer, Roland A. | Author |
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Year | 1994 (May 2) | Volume | 106 |
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Issue | 9 |
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Publisher | Wiley |
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DOI | doi:10.1002/ange.19941060932Search in ResearchGate |
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| Generate Citation Formats |
Mindat Ref. ID | 7291673 | Long-form Identifier | mindat:1:5:7291673:9 |
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GUID | 0 |
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Full Reference | Fischer, Roland A. (1994) Chemical Vapor Deposition. Principles and Applications. Herausgegeben vonM. L. Hitchman undK. F. Jensen. Academic Press, London, 1993. 677 S., geb. 75.00 £. - ISBN 0-12-349670-5. Angewandte Chemie, 106 (9). 1062-1063 doi:10.1002/ange.19941060932 |
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Plain Text | Fischer, Roland A. (1994) Chemical Vapor Deposition. Principles and Applications. Herausgegeben vonM. L. Hitchman undK. F. Jensen. Academic Press, London, 1993. 677 S., geb. 75.00 £. - ISBN 0-12-349670-5. Angewandte Chemie, 106 (9). 1062-1063 doi:10.1002/ange.19941060932 |
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In | (1994, May) Angewandte Chemie Vol. 106 (9) Wiley |
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