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Ishizaki, Takahiro, Ohtomo, Takeshi, Sakamoto, Yusuke, Fuwa, Akio (2004) Effect of pH on the Electrodeposition of ZnTe Film from a Citric Acid Solution. MATERIALS TRANSACTIONS, 45 (2). 277-280 doi:10.2320/matertrans.45.277

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Reference TypeJournal (article/letter/editorial)
TitleEffect of pH on the Electrodeposition of ZnTe Film from a Citric Acid Solution
JournalMATERIALS TRANSACTIONS
AuthorsIshizaki, TakahiroAuthor
Ohtomo, TakeshiAuthor
Sakamoto, YusukeAuthor
Fuwa, AkioAuthor
Year2004Volume45
Issue2
PublisherJapan Institute of Metals
DOIdoi:10.2320/matertrans.45.277Search in ResearchGate
Generate Citation Formats
Mindat Ref. ID7777297Long-form Identifiermindat:1:5:7777297:2
GUID0
Full ReferenceIshizaki, Takahiro, Ohtomo, Takeshi, Sakamoto, Yusuke, Fuwa, Akio (2004) Effect of pH on the Electrodeposition of ZnTe Film from a Citric Acid Solution. MATERIALS TRANSACTIONS, 45 (2). 277-280 doi:10.2320/matertrans.45.277
Plain TextIshizaki, Takahiro, Ohtomo, Takeshi, Sakamoto, Yusuke, Fuwa, Akio (2004) Effect of pH on the Electrodeposition of ZnTe Film from a Citric Acid Solution. MATERIALS TRANSACTIONS, 45 (2). 277-280 doi:10.2320/matertrans.45.277
In(2004) MATERIALS TRANSACTIONS Vol. 45 (2) Japan Institute of Metals

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Ishizaki, Takahiro, Ohtomo, Takeshi, Fuwa, Akio (2004) Electrodeposition of ZnTe Film with High Current Efficiency at Low Overpotential from a Citric Acid Bath. Journal of the Electrochemical Society, 151. doi:10.1149/1.1643738
Ishizaki, Takahiro, Ohtomo, Takeshi, Fuwa, Akio (2004) Structural, optical and electrical properties of ZnTe thin films electrochemically deposited from a citric acid aqueous solution. Journal of Physics D: Applied Physics, 37. 255-260 doi:10.1088/0022-3727/37/2/014
Ohtomo, Takeshi, Ishizaki, Takahiro, Ogiwara, Daisuke, Kawarada, Hiroshi, Fuwa, Akio (2005) Evaluations of Electrical Properties for ZnTe Thin Films Electrodeposited from a Citric Acid Bath with a Hall Effect Measurement. Journal of the Japan Institute of Metals, 69 (3). 298-302 doi:10.2320/jinstmet.69.298
Ishimori, Yasuhiro, Ishizaki, Takahiro, Ohtomo, Takeshi, Fuwa, Akio (2004) Electrodeposition of Bi2Te3 Films from Ammoniacal Basic Solutions Containing Nitrilotriacetic Acid. Journal of the Japan Institute of Metals, 68 (6). 406-411 doi:10.2320/jinstmet.68.406
Ishizaki, Takahiro, Yata, Daisuke, Fuwa, Akio (2003) Electrodeposition of a Copper-Tellurium Compound under Diffusion-Limiting Control. MATERIALS TRANSACTIONS, 44 (8). 1583-1587 doi:10.2320/matertrans.44.1583
Ishizaki, Takahiro, Saito, Nagahiro, Fuwa, Akio (1999) The Effect of Citric Acid and EDTA Addition on Cu–In Alloy Electrochemical Deposition. Materials Transactions, JIM, 40. 867-870 doi:10.2320/matertrans1989.40.867
Ishizaki, Takahiro, Saito, Nagahiro, Takai, Osamu, Asakura, Shuichi, Goto, Kaori, Fuwa, Akio (2005) An investigation into the effect of ionic species on the formation of ZnTe from a citric acid electrolyte. Electrochimica Acta, 50 (16). 3509-3516 doi:10.1016/j.electacta.2004.12.028
ISIZAKI, Takahiro, SAITO, Nagahiro, FUWA, Akio (2000) Electrodeposition of Cu-In alloy from the Solution Containing Citric Acid. Shigen-to-Sozai, 116 (3). 217-221 doi:10.2473/shigentosozai.116.217
Suzuki, Tomohiro, Ishizaki, Takahiro, Mori, Satoru, Fuwa, Akio (2004) Preparation and Characterization of a New Ge-Sb-Te Thin Film. Journal of the Japan Institute of Metals, 68 (2). 90-93 doi:10.2320/jinstmet.68.90
Saito, Nagahiro, Ishizaki, Takahiro, Fuwa, Akio (2000) Kinetics of SiHCl3 and SiCl4 Evolution in Si(s)–HCl(g) System Simulated by Ab-initio MO. Materials Transactions, JIM, 41. 383-392 doi:10.2320/matertrans1989.41.383
Kitada, Masahiro, Kirino, Fumiyoshi (2005) Effects of Sputter Order and Oxide Layer on Amorphous Formation of Zr-Ni Thin Film System. MATERIALS TRANSACTIONS, 46 (2). 277-280 doi:10.2320/matertrans.46.277
 
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