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Bae, Joon Woo, Lim, Jae-Won, Mimura, Kouji, Isshiki, Minoru (2004) Agglomeration of Copper Thin Film in Cu/Ta/Si Structure. MATERIALS TRANSACTIONS, 45 (3). 877-879 doi:10.2320/matertrans.45.877

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Reference TypeJournal (article/letter/editorial)
TitleAgglomeration of Copper Thin Film in Cu/Ta/Si Structure
JournalMATERIALS TRANSACTIONS
AuthorsBae, Joon WooAuthor
Lim, Jae-WonAuthor
Mimura, KoujiAuthor
Isshiki, MinoruAuthor
Year2004Volume45
Issue3
PublisherJapan Institute of Metals
DOIdoi:10.2320/matertrans.45.877Search in ResearchGate
Generate Citation Formats
Mindat Ref. ID7777405Long-form Identifiermindat:1:5:7777405:9
GUID0
Full ReferenceBae, Joon Woo, Lim, Jae-Won, Mimura, Kouji, Isshiki, Minoru (2004) Agglomeration of Copper Thin Film in Cu/Ta/Si Structure. MATERIALS TRANSACTIONS, 45 (3). 877-879 doi:10.2320/matertrans.45.877
Plain TextBae, Joon Woo, Lim, Jae-Won, Mimura, Kouji, Isshiki, Minoru (2004) Agglomeration of Copper Thin Film in Cu/Ta/Si Structure. MATERIALS TRANSACTIONS, 45 (3). 877-879 doi:10.2320/matertrans.45.877
In(2004) MATERIALS TRANSACTIONS Vol. 45 (3) Japan Institute of Metals

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Bae, Joon Woo, Lim, Jae-Won, Mimura, Kouji, Isshiki, Minoru (2006) Influence of Substrate Bias Voltage on the Impurity Concentrations in Hf Films Deposited by Ion Beam Deposition Method. MATERIALS TRANSACTIONS, 47 (2). 279-282 doi:10.2320/matertrans.47.279
Bae, Joon Woo, Lim, Jae-Won, Mimura, Kouji, Isshiki, Minoru (2006) Refining effect of hydrogen plasma arc melting on hafnium metal. Materials Letters, 60. 2604-2605 doi:10.1016/j.matlet.2006.01.061
Bae, Joon Woo, Lim, Jae-Won, Mimura, Kouji, Uchikoshi, Masahito, Miyazaki, Takamichi, Isshiki, Minoru (2010) Effect of UV lamp irradiation during oxidation of Zr/Pt/Si structure on electrical properties of Pt/ZrO2/Pt/Si structure. Applied Surface Science, 256. 3518-3521 doi:10.1016/j.apsusc.2009.12.101
Lim, Jae-Won, Bae, Joon Woo, Mimura, Kouji, Isshiki, Minoru (2005) Interpretation of Dominant Impurities in Cu Films by Secondary Ion Mass Spectrometry and Glow Discharge Mass Spectrometry. Japanese Journal of Applied Physics, 44 (1) 373-374 doi:10.1143/jjap.44.373
Lim, Jae-Won, Ishikawa, Yukio, Miyake, Kiyoshi, Yamashita, Mutsuo, Isshiki, Minoru (2002) Improvement of Ta Barrier Film Properties in Cu Interconnection by Using a Non-mass Separated Ion Beam Deposition Method. MATERIALS TRANSACTIONS, 43 (3). 478-481 doi:10.2320/matertrans.43.478
Bae, Joon Woo, Lim, Jae-Won, Mimura, Kouji, Uchikoshi, Masahito, Wada, Mitsuhiro, Ikeda, Makoto, Isshiki, Minoru (2009) Influence of substrate bias voltage on properties of Pt thin films deposited by non-mass separated ion beam deposition method. Materials Letters, 63. 2181-2184 doi:10.1016/j.matlet.2009.07.015
Bae, Joon Woo, Lim, Jae-Won, Kim, Sun Joong, Mimura, Kouji, Miyazaki, Takamichi, Uchikoshi, Masahito, Isshiki, Minoru (2010) Preparation of ZrO2 dielectric layers by subsequent oxidation after Zr film deposition with negative substrate bias voltage. Metals and Materials International, 16. 447-452 doi:10.1007/s12540-010-0615-5
Zhu, Yongfu, Mimura, Kouji, Isshiki, Minoru (2002) Oxidation Mechanism of Copper at 623-1073 K. MATERIALS TRANSACTIONS, 43 (9). 2173-2176 doi:10.2320/matertrans.43.2173
Lim, Jae-Won, Mimura, Kouji, Miyake, Kiyoshi, Yamashita, Mutsuo, Isshiki, Minoru (2003) Effect of Substrate Bias Voltage on the Thermal Stability of Cu/Ta/Si Structures Deposited by Ion Beam Deposition. Japanese Journal of Applied Physics, 42. 2780-2785 doi:10.1143/jjap.42.2780
Zhu, Yongfu, Mimura, Kouji, Ishikawa, Yukio, Isshiki, Minoru (2002) Effect of Floating Zone Refining under Reduced Hydrogen Pressure on Copper Purification. MATERIALS TRANSACTIONS, 43 (11). 2802-2807 doi:10.2320/matertrans.43.2802
Lim, Jae-Won, Kim, Min-Seuk, Munirathnam, N. R., Le, Minh-Tung, Uchikoshi, Masahito, Mimura, Kouji, Isshiki, Minoru, Kwon, Hyuk-Chon, Choi, Good-Sun (2008) Effect of Ar/Ar-H2 Plasma Arc Melting on Cu Purification. MATERIALS TRANSACTIONS, 49 (8). 1826-1829 doi:10.2320/matertrans.mra2008054
 
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