Khoo, Khyoupin, Onuki, Jin, Nagano, Takahiro, Chonan, Yasunori, Akahoshi, Haruo, Tobita, Toshimi, Chiba, Masahiro, Saito, Tatsuyuki, Ishikawa, Kensuke (2007) Influence of Grain Size Distributions on the Resistivity of 80 nm Wide Cu Interconnects. MATERIALS TRANSACTIONS, 48 (3). 622-624 doi:10.2320/matertrans.48.622
| Reference Type | Journal (article/letter/editorial) | ||
|---|---|---|---|
| Title | Influence of Grain Size Distributions on the Resistivity of 80 nm Wide Cu Interconnects | ||
| Journal | MATERIALS TRANSACTIONS | ||
| Authors | Khoo, Khyoupin | Author | |
| Onuki, Jin | Author | ||
| Nagano, Takahiro | Author | ||
| Chonan, Yasunori | Author | ||
| Akahoshi, Haruo | Author | ||
| Tobita, Toshimi | Author | ||
| Chiba, Masahiro | Author | ||
| Saito, Tatsuyuki | Author | ||
| Ishikawa, Kensuke | Author | ||
| Year | 2007 | Volume | 48 |
| Issue | 3 | ||
| Publisher | Japan Institute of Metals | ||
| DOI | doi:10.2320/matertrans.48.622Search in ResearchGate | ||
| Generate Citation Formats | |||
| Mindat Ref. ID | 7779071 | Long-form Identifier | mindat:1:5:7779071:0 |
| GUID | 0 | ||
| Full Reference | Khoo, Khyoupin, Onuki, Jin, Nagano, Takahiro, Chonan, Yasunori, Akahoshi, Haruo, Tobita, Toshimi, Chiba, Masahiro, Saito, Tatsuyuki, Ishikawa, Kensuke (2007) Influence of Grain Size Distributions on the Resistivity of 80 nm Wide Cu Interconnects. MATERIALS TRANSACTIONS, 48 (3). 622-624 doi:10.2320/matertrans.48.622 | ||
| Plain Text | Khoo, Khyoupin, Onuki, Jin, Nagano, Takahiro, Chonan, Yasunori, Akahoshi, Haruo, Tobita, Toshimi, Chiba, Masahiro, Saito, Tatsuyuki, Ishikawa, Kensuke (2007) Influence of Grain Size Distributions on the Resistivity of 80 nm Wide Cu Interconnects. MATERIALS TRANSACTIONS, 48 (3). 622-624 doi:10.2320/matertrans.48.622 | ||
| In | (2007) MATERIALS TRANSACTIONS Vol. 48 (3) Japan Institute of Metals | ||
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