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Cho, Hiroki, Kim, Jae Il, Kim, Hee Young, Miyazaki, Shuichi (2005) Effect of Low-Temperature Crystallization on Shape Memory Behavior and Microstructure of Sputter-Deposited Ti-Ni Amorphous Thin Films. Journal of the Japan Institute of Metals, 69 (8). 614-621 doi:10.2320/jinstmet.69.614

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Reference TypeJournal (article/letter/editorial)
TitleEffect of Low-Temperature Crystallization on Shape Memory Behavior and Microstructure of Sputter-Deposited Ti-Ni Amorphous Thin Films
JournalJournal of the Japan Institute of Metals
AuthorsCho, HirokiAuthor
Kim, Jae IlAuthor
Kim, Hee YoungAuthor
Miyazaki, ShuichiAuthor
Year2005Volume69
Issue8
PublisherJapan Institute of Metals
DOIdoi:10.2320/jinstmet.69.614Search in ResearchGate
Generate Citation Formats
Mindat Ref. ID7816100Long-form Identifiermindat:1:5:7816100:3
GUID0
Full ReferenceCho, Hiroki, Kim, Jae Il, Kim, Hee Young, Miyazaki, Shuichi (2005) Effect of Low-Temperature Crystallization on Shape Memory Behavior and Microstructure of Sputter-Deposited Ti-Ni Amorphous Thin Films. Journal of the Japan Institute of Metals, 69 (8). 614-621 doi:10.2320/jinstmet.69.614
Plain TextCho, Hiroki, Kim, Jae Il, Kim, Hee Young, Miyazaki, Shuichi (2005) Effect of Low-Temperature Crystallization on Shape Memory Behavior and Microstructure of Sputter-Deposited Ti-Ni Amorphous Thin Films. Journal of the Japan Institute of Metals, 69 (8). 614-621 doi:10.2320/jinstmet.69.614
In(2005) Journal of the Japan Institute of Metals Vol. 69 (8) Japan Institute of Metals


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