Cho, Hiroki, Kim, Jae Il, Kim, Hee Young, Miyazaki, Shuichi (2005) Effect of Low-Temperature Crystallization on Shape Memory Behavior and Microstructure of Sputter-Deposited Ti-Ni Amorphous Thin Films. Journal of the Japan Institute of Metals, 69 (8). 614-621 doi:10.2320/jinstmet.69.614
Reference Type | Journal (article/letter/editorial) | ||
---|---|---|---|
Title | Effect of Low-Temperature Crystallization on Shape Memory Behavior and Microstructure of Sputter-Deposited Ti-Ni Amorphous Thin Films | ||
Journal | Journal of the Japan Institute of Metals | ||
Authors | Cho, Hiroki | Author | |
Kim, Jae Il | Author | ||
Kim, Hee Young | Author | ||
Miyazaki, Shuichi | Author | ||
Year | 2005 | Volume | 69 |
Issue | 8 | ||
Publisher | Japan Institute of Metals | ||
DOI | doi:10.2320/jinstmet.69.614Search in ResearchGate | ||
Generate Citation Formats | |||
Mindat Ref. ID | 7816100 | Long-form Identifier | mindat:1:5:7816100:3 |
GUID | 0 | ||
Full Reference | Cho, Hiroki, Kim, Jae Il, Kim, Hee Young, Miyazaki, Shuichi (2005) Effect of Low-Temperature Crystallization on Shape Memory Behavior and Microstructure of Sputter-Deposited Ti-Ni Amorphous Thin Films. Journal of the Japan Institute of Metals, 69 (8). 614-621 doi:10.2320/jinstmet.69.614 | ||
Plain Text | Cho, Hiroki, Kim, Jae Il, Kim, Hee Young, Miyazaki, Shuichi (2005) Effect of Low-Temperature Crystallization on Shape Memory Behavior and Microstructure of Sputter-Deposited Ti-Ni Amorphous Thin Films. Journal of the Japan Institute of Metals, 69 (8). 614-621 doi:10.2320/jinstmet.69.614 | ||
In | (2005) Journal of the Japan Institute of Metals Vol. 69 (8) Japan Institute of Metals |
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