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Yoshigoe, Akitaka, Hirano, Shinya, Urisu, Tsuneo (1998) Surface hydrogen and growth mechanisms of synchrotron radiation-assisted silicon gas source molecular beam epitaxy using disilane. Applied Organometallic Chemistry, 12 (4). 253-256 doi:10.1002/(sici)1099-0739(199804)12:4<253::aid-aoc701>3.0.co;2-n

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Reference TypeJournal (article/letter/editorial)
TitleSurface hydrogen and growth mechanisms of synchrotron radiation-assisted silicon gas source molecular beam epitaxy using disilane
JournalApplied Organometallic Chemistry
AuthorsYoshigoe, AkitakaAuthor
Hirano, ShinyaAuthor
Urisu, TsuneoAuthor
Year1998 (April)Volume12
Issue4
PublisherWiley
DOIdoi:10.1002/(sici)1099-0739(199804)12:4<253::aid-aoc701>3.0.co;2-nSearch in ResearchGate
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Mindat Ref. ID7841221Long-form Identifiermindat:1:5:7841221:7
GUID0
Full ReferenceYoshigoe, Akitaka, Hirano, Shinya, Urisu, Tsuneo (1998) Surface hydrogen and growth mechanisms of synchrotron radiation-assisted silicon gas source molecular beam epitaxy using disilane. Applied Organometallic Chemistry, 12 (4). 253-256 doi:10.1002/(sici)1099-0739(199804)12:4<253::aid-aoc701>3.0.co;2-n
Plain TextYoshigoe, Akitaka, Hirano, Shinya, Urisu, Tsuneo (1998) Surface hydrogen and growth mechanisms of synchrotron radiation-assisted silicon gas source molecular beam epitaxy using disilane. Applied Organometallic Chemistry, 12 (4). 253-256 doi:10.1002/(sici)1099-0739(199804)12:43.0.co;2-n
In(1998, April) Applied Organometallic Chemistry Vol. 12 (4) Wiley

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Yoshigoe, Akitaka, Nagasono, Mitsuru, Mase, Kazuhiko, Urisu, Tsuneo (1995) Synchrotron Radiation Irradiation Effects forSiHnon Si(100) Surface in the Synchrotron Radiation Stimulated Si Gas Source Molecular Beam Epitaxy. Japanese Journal of Applied Physics, 34 (12) 6894 doi:10.7567/jjap.34.6894
Yoshigoe, Akitaka, Nagasono, Mitsuru, Mase, Kazuhiko, Urisu, Tsuneo (1995) Synchrotron Radiation Irradiation Effects forSiHnon Si(100) Surface in the Synchrotron Radiation Stimulated Si Gas Source Molecular Beam Epitaxy. Japanese Journal of Applied Physics, 34. 6894-6898 doi:10.1143/jjap.34.6894
Ehrich, H., Born, D., Richter-Mendau, J., Lieske, H. (1998) Interaction of alkali salt promoters and silicon impurities in Rochow contact masses. Applied Organometallic Chemistry, 12 (4). 257-264 doi:10.1002/(sici)1099-0739(199804)12:4<257::aid-aoc703>3.0.co;2-5
Craig, Peter J., Laurie, Stuart H., McDonagh, Reman (1998) Extent and rate of solubilization of tin by iodomethane-water mixtures. Applied Organometallic Chemistry, 12 (4). 237-241 doi:10.1002/(sici)1099-0739(199804)12:4<237::aid-aoc699>3.0.co;2-k
Hirano, Shinya, Noda, Hideyuki, Yoshigoe, Akitaka, Gheyas, Syed Irfan, Urisu, Tsuneo (1998) Annealing and Synchrotron Radiation Irradiation Effects on Hydrogen Terminated Si(100) Surfaces Investigated by Infrared Reflection Absorption Spectroscopy. Japanese Journal of Applied Physics, 37. 6991-6995 doi:10.1143/jjap.37.6991
Lai, Vivian W.-M., Cullen, William R., Harrington, Christopher F., Reimer, Kenneth J. (1998) Seasonal changes in arsenic speciation inFucus species. Applied Organometallic Chemistry, 12 (4). 243-251 doi:10.1002/(sici)1099-0739(199804)12:4<243::aid-aoc700>3.0.co;2-r
Glidewell, Christopher (1998) Book review: Chemical bonds: A dialog. J.K. Burdett, Wiley, Chichester, 1997. 166 pages, �17.99 (paperback). ISBN 0-471-97130-8. Applied Organometallic Chemistry, 12 (4). 298 doi:10.1002/(sici)1099-0739(199804)12:4<298::aid-aoc698>3.0.co;2-e
Craig, P. J. (1998) Book review: Advanced applications of NMR to organometallic chemistry. M. Gielen, R. Willem and B. Wrackmeyer (Eds). John Wiley, Chichester, 1996. 396 pages. �100. ISBN 0471-959-38-3. Applied Organometallic Chemistry, 12 (4). 297 doi:10.1002/(sici)1099-0739(199804)12:4<297::aid-aoc696>3.0.co;2-n
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