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Tomovská, Radmila, Bastl, Zdenĕk, Bohác̆ek, Jaroslav, Pola, Josef (2003) Laser photolysis of trimethoxysilane: chemical vapour deposition of nanostructured silicone powders with SiH and SiOCH3bonds. Applied Organometallic Chemistry, 17 (2). 113-119 doi:10.1002/aoc.397

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Reference TypeJournal (article/letter/editorial)
TitleLaser photolysis of trimethoxysilane: chemical vapour deposition of nanostructured silicone powders with SiH and SiOCH3bonds
JournalApplied Organometallic Chemistry
AuthorsTomovská, RadmilaAuthor
Bastl, ZdenĕkAuthor
Bohác̆ek, JaroslavAuthor
Pola, JosefAuthor
Year2003 (February)Volume17
Issue2
PublisherWiley
DOIdoi:10.1002/aoc.397Search in ResearchGate
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Mindat Ref. ID7842015Long-form Identifiermindat:1:5:7842015:5
GUID0
Full ReferenceTomovská, Radmila, Bastl, Zdenĕk, Bohác̆ek, Jaroslav, Pola, Josef (2003) Laser photolysis of trimethoxysilane: chemical vapour deposition of nanostructured silicone powders with SiH and SiOCH3bonds. Applied Organometallic Chemistry, 17 (2). 113-119 doi:10.1002/aoc.397
Plain TextTomovská, Radmila, Bastl, Zdenĕk, Bohác̆ek, Jaroslav, Pola, Josef (2003) Laser photolysis of trimethoxysilane: chemical vapour deposition of nanostructured silicone powders with SiH and SiOCH3bonds. Applied Organometallic Chemistry, 17 (2). 113-119 doi:10.1002/aoc.397
In(2003, February) Applied Organometallic Chemistry Vol. 17 (2) Wiley

See Also

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Fajgar, Radek, Bastl, ZdeněK, Tláskal, Jaroslav, Pola, Josef (1995) Chemical vapour deposition of germanium-containing films by IR laser-induced decomposition of ethoxy(trimethyl)germane. Applied Organometallic Chemistry, 9 (8). 667-673 doi:10.1002/aoc.590090804
Kupčı́k, Jaroslav, Bastl, Zdenĕk, Šubrt, Jan, Pola, Josef, Papadimitriou, Vassilis C, Prosmitis, Alexandros V, Papagiannakopoulos, Panos (2001) IR laser-induced decomposition of hexamethyldisiloxane for chemical vapour deposition of nano-structured hydrido(methyl)silicone powders. Journal of Analytical and Applied Pyrolysis, 57 (1). 109-118 doi:10.1016/s0165-2370(00)00109-1
Pola, Josef, Bastl, Zden?k, ?ubrt, Jan, Ouchi, Akihiko (2001) Atmospheric pressure chemical vapour deposition of selenium and tellurium films by UV laser photolysis of diethyl selenium and diethyl tellurium. Applied Organometallic Chemistry, 15 (11). 924-930 doi:10.1002/aoc.230
Pola, Josef, Galíková, Anna, Bastl, Zdeněk, Šubrt, Jan, Vacek, Karel, Brus, Jiří, Ouchi, Akihiko (2006) UV laser deposition of nanostructured Si/C/O/N/H from disilazane precursors and evolution to silicon oxycarbonitride. Applied Organometallic Chemistry, 20 (10). 648-655 doi:10.1002/aoc.1135
Ouchi, Akihiko, Koga, Yoshinori, Bastl, Zdeněk, Pola, Josef (1999) UV-laser-induced photolysis of trimethyl(vinyloxy)silane for chemical vapour deposition of polysiloxane films. Applied Organometallic Chemistry, 13 (9). 643-647 doi:10.1002/(sici)1099-0739(199909)13:9<643::aid-aoc886>3.0.co;2-#
Pola, Josef, Vítek, Josef, Bastl, Zdeněk, Urbanová, M., Šubrt, Jan, Taylor, Roger (1997) IR laser-induced decomposition of prop-2-enylsilane and ethynylsilane for chemical vapour deposition of Si/C phases. Journal of Materials Chemistry, 7. 1415-1420 doi:10.1039/a700370f
Dřínek, Vladislav, Bastl, Zdeněk, Šubrt, Jan, Taylor, Roger, Pola, Josef (1995) IR laser-induced decomposition of tetravinylsilane for chemical vapour deposition of Si/C/H materials. Journal of Analytical and Applied Pyrolysis, 35 (2). 199-206 doi:10.1016/0165-2370(95)00909-0
Tomovska, Radmila, Bastl, Zden?k, Pola, Josef (2004) UV Laser Chemical Vapor Deposition of Nano-Chained Copolymer from Carbon Disulfide and Ethene. Macromolecular Chemistry and Physics, 205. 2339-2345 doi:10.1002/macp.200400277
Urbanová, Markéta, Pola, Josef (2002) UV laser photolysis of silacyclopent-3-ene: effect of admixtures on nature of chemically vapour-deposited organosilicon films. Applied Organometallic Chemistry, 16 (10). 580-586 doi:10.1002/aoc.348
Pola, Josef, Pokorná, Dana, Diánez, María Jesús, Sayagués, María Jesús, Bastl, Zdeněk, Vorlíček, Vladimír (2005) IR laser-induced synthesis of nanostructured gemanium telluride in the gas phase. Applied Organometallic Chemistry, 19 (7). 854-858 doi:10.1002/aoc.916
Pola, J., Bastl, Z., Tläskal, J., Beckers, H., BÜRger, H., Moritz, P., Weiss, P., Sigrist, M. (1993) Si/C/F/H materials from laser-explosive decomposition of fluoromethylsilanes. Applied Organometallic Chemistry, 7 (6). 381-389 doi:10.1002/aoc.590070605
 
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