Reference Type | Journal (article/letter/editorial) |
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Title | Microstructure and properties of indium tin oxide thin films deposited by RF-magnetron sputtering |
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Journal | Rare Metals |
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Authors | LI, S | Author |
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QIAO, X | Author |
CHEN, J | Author |
JIA, F | Author |
WU, C | Author |
Year | 2006 (August) | Volume | 25 |
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Publisher | Springer Science and Business Media LLC |
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DOI | doi:10.1016/s1001-0521(06)60068-5Search in ResearchGate |
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| Generate Citation Formats |
Mindat Ref. ID | 8047384 | Long-form Identifier | mindat:1:5:8047384:0 |
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GUID | 0 |
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Full Reference | LI, S, QIAO, X, CHEN, J, JIA, F, WU, C (2006) Microstructure and properties of indium tin oxide thin films deposited by RF-magnetron sputtering. Rare Metals, 25. 359-364 doi:10.1016/s1001-0521(06)60068-5 |
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Plain Text | LI, S, QIAO, X, CHEN, J, JIA, F, WU, C (2006) Microstructure and properties of indium tin oxide thin films deposited by RF-magnetron sputtering. Rare Metals, 25. 359-364 doi:10.1016/s1001-0521(06)60068-5 |
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In | (2006) Rare Metals Vol. 25. Springer Science and Business Media LLC |
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