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Jillie, D. W., Kroger, H., Smith, L. N., Cukauskas, E. J., Nisenoff, M. (1982) Erratum: Niobium nitride‐niobium Josephson tunnel junctions with sputtered amorphous silicon barriers [Appl. Phys. Lett. 40, 747 (1982)]. Applied Physics Letters, 41 (9). 897 doi:10.1063/1.93722

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Reference TypeJournal (article/letter/editorial)
TitleErratum: Niobium nitride‐niobium Josephson tunnel junctions with sputtered amorphous silicon barriers [Appl. Phys. Lett. 40, 747 (1982)]
JournalApplied Physics Letters
AuthorsJillie, D. W.Author
Kroger, H.Author
Smith, L. N.Author
Cukauskas, E. J.Author
Nisenoff, M.Author
Year1982 (November)Volume41
Issue9
PublisherAIP Publishing
DOIdoi:10.1063/1.93722Search in ResearchGate
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Mindat Ref. ID8471330Long-form Identifiermindat:1:5:8471330:2
GUID0
Full ReferenceJillie, D. W., Kroger, H., Smith, L. N., Cukauskas, E. J., Nisenoff, M. (1982) Erratum: Niobium nitride‐niobium Josephson tunnel junctions with sputtered amorphous silicon barriers [Appl. Phys. Lett. 40, 747 (1982)]. Applied Physics Letters, 41 (9). 897 doi:10.1063/1.93722
Plain TextJillie, D. W., Kroger, H., Smith, L. N., Cukauskas, E. J., Nisenoff, M. (1982) Erratum: Niobium nitride‐niobium Josephson tunnel junctions with sputtered amorphous silicon barriers [Appl. Phys. Lett. 40, 747 (1982)]. Applied Physics Letters, 41 (9). 897 doi:10.1063/1.93722
In(1982, November) Applied Physics Letters Vol. 41 (9) AIP Publishing

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Jillie, D. W., Kroger, H., Smith, L. N., Cukauskas, E. J., Nisenoff, M. (1982) Niobium nitride‐niobium Josephson tunnel junctions with sputtered amorphous silicon barriers. Applied Physics Letters, 40 (8). 747-750 doi:10.1063/1.93214
Kroger, H., Jillie, D. W., Smith, L. N., Phaneuf, L. E., Potter, C. N., Shaw, D. M., Cukauskas, E. J., Nisenoff, M. (1984) Josephson tunnel junctions with chemically vapor deposited polycrystalline germanium barriers. Applied Physics Letters, 44 (5). 562-564 doi:10.1063/1.94803
Kroger, H., Smith, L. N., Jillie, D. W. (1981) Selective niobium anodization process for fabricating Josephson tunnel junctions. Applied Physics Letters, 39 (3). 280-282 doi:10.1063/1.92672
Shinoki, F., Shoji, A., Kosaka, S., Takada, S., Hayakawa, H. (1981) Niobium nitride Josephson tunnel junctions with oxidized amorphous silicon barriers. Applied Physics Letters, 38 (4). 285-286 doi:10.1063/1.92308
Shoji, Akira, Shinoki, Fujitoshi, Kosaka, Shin, Aoyagi, Masahiro, Hayakawa, Hisao (1982) New fabrication process for Josephson tunnel junctions with (niobium nitride, niobium) double‐layered electrodes. Applied Physics Letters, 41 (11). 1097-1099 doi:10.1063/1.93378
Boyers, David G., Tiller, William A. (1982) Erratum: Plasma bubble domains: A magnetic bubble analog [Appl. Phys. Lett. 41, 28 (1982)]. Applied Physics Letters, 41 (9). 897 doi:10.1063/1.93723
Jain, A. K., Likharev, K. K., Lukens, J. E., Sauvageau, J. E. (1983) Erratum: Low‐frequency behavior of coupled Josephson junctions near phase locking [Appl. Phys. Lett. 41, 566 (1982)]. Applied Physics Letters, 42 (3). 305 doi:10.1063/1.94112
Hou, C. J., Fink, R. L., Hilbert, Claude, Kroger, Harry (1992) Erratum: ‘‘Low‐leakage thin‐film superconductor‐insulator‐normal metal tunnel junctions on co‐evaporated Ba1−xRbxBiO3 and rf‐sputtered Ba1−xKxBiO3’’ [Appl. Phys. Lett. 60, 1262 (1992)]. Applied Physics Letters, 60 (22). 2813 doi:10.1063/1.107449
Dieleman, J., Martens, T. H. G. (1982) Erratum: Strong orientation dependence of the formation of surface stacking faults during oxidation of float‐zone silicon [Appl. Phys. Lett. 40, 340 (1982)]. Applied Physics Letters, 41 (2). 208 doi:10.1063/1.93720
Hwang, H. L., Hwu, C. C., Liue, J. C., Lin, H. H. (1983) Erratum: Analysis of low‐pressure chemical vapor deposited silicon nitride by Rutherford backscattering spectrometry [Appl. Phys. Lett. 41, 844 (1982)]. Applied Physics Letters, 42 (3). 305 doi:10.1063/1.94117
Shoji, Akira, Aoyagi, Masahiro, Kosaka, Shin, Shinoki, Fujitoshi, Hayakawa, Hisao (1985) Niobium nitride Josephson tunnel junctions with magnesium oxide barriers. Applied Physics Letters, 46 (11). 1098-1100 doi:10.1063/1.95774
 
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