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Boswell, R. W., Porteous, R. K. (1987) Large volume, high density rf inductively coupled plasma. Applied Physics Letters, 50 (17). 1130-1132 doi:10.1063/1.98257

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Reference TypeJournal (article/letter/editorial)
TitleLarge volume, high density rf inductively coupled plasma
JournalApplied Physics Letters
AuthorsBoswell, R. W.Author
Porteous, R. K.Author
Year1987 (April 27)Volume50
Issue17
PublisherAIP Publishing
DOIdoi:10.1063/1.98257Search in ResearchGate
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Mindat Ref. ID8479928Long-form Identifiermindat:1:5:8479928:7
GUID0
Full ReferenceBoswell, R. W., Porteous, R. K. (1987) Large volume, high density rf inductively coupled plasma. Applied Physics Letters, 50 (17). 1130-1132 doi:10.1063/1.98257
Plain TextBoswell, R. W., Porteous, R. K. (1987) Large volume, high density rf inductively coupled plasma. Applied Physics Letters, 50 (17). 1130-1132 doi:10.1063/1.98257
In(1987, April) Applied Physics Letters Vol. 50 (17) AIP Publishing

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Boswell, R. W., Porteous, R. K. (1987) Etching in a pulsed plasma. Journal of Applied Physics, 62 (8). 3123-3129 doi:10.1063/1.339362
Cui, Chunshi, Boswell, R. W. (1993) Role of excitation frequency in a low‐pressure, inductively coupled radio‐frequency, magnetized plasma. Applied Physics Letters, 63 (17). 2330-2332 doi:10.1063/1.110516
Perry, A. J., Boswell, R. W. (1989) Fast anisotropic etching of silicon in an inductively coupled plasma reactor. Applied Physics Letters, 55 (2). 148-150 doi:10.1063/1.102127
Schumacher, R. W., Hershkowitz, N., MacKenzie, K. R. (1976) Characteristics of a large‐volume rf‐grid discharge plasma. Journal of Applied Physics, 47 (3). 886-893 doi:10.1063/1.322675
Boswell, R., Porteous, R., Prytz, A., Bouchoule, A., Ranson, P. (1982) Some features of RF excited fully ionized low pressure argon plasma. Physics Letters A, 91. 163-166 doi:10.1016/0375-9601(82)90823-4
Camparo, J. C., Mackay, R. (2006) Ion-wave stabilization of an inductively coupled plasma. Applied Physics Letters, 88 (17). 173510pp. doi:10.1063/1.2198108
Daltrini, A. M., Moshkalev, S. A., Morgan, T. J., Piejak, R. B., Graham, W. G. (2008) Plasma power measurement and hysteresis in the E–H transition of a rf inductively coupled plasma system. Applied Physics Letters, 92 (6). 61504pp. doi:10.1063/1.2844885
Boswell, R. W., Morey, I. J., Porteous, R. K. (1989) Wave phenomena preceding and during a beam-plasma discharge. Journal of Geophysical Research, 94. 2654 doi:10.1029/ja094ia03p02654
Mostaghimi, Javad, Proulx, Pierre, Boulos, Maher I. (1987) A two‐temperature model of the inductively coupled rf plasma. Journal of Applied Physics, 61 (5). 1753-1760 doi:10.1063/1.338073
Nelson, S. A., Buhrman, R. A. (1987) Thin silicon oxides grown by low‐temperature rf plasma anodization and deposition. Applied Physics Letters, 50 (16). 1095-1097 doi:10.1063/1.97929
Boswell, R. W., Morey, I. J. (1988) Self‐consistent simulation of a parallel‐plate rf discharge. Applied Physics Letters, 52 (1). 21-23 doi:10.1063/1.99327
 
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