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Powell, M. J., van Berkel, C., French, I. D., Nicholls, D. H. (1987) Bias dependence of instability mechanisms in amorphous silicon thin‐film transistors. Applied Physics Letters, 51 (16). 1242-1244 doi:10.1063/1.98692

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Reference TypeJournal (article/letter/editorial)
TitleBias dependence of instability mechanisms in amorphous silicon thin‐film transistors
JournalApplied Physics Letters
AuthorsPowell, M. J.Author
van Berkel, C.Author
French, I. D.Author
Nicholls, D. H.Author
Year1987 (October 19)Volume51
Issue16
PublisherAIP Publishing
DOIdoi:10.1063/1.98692Search in ResearchGate
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Mindat Ref. ID8481144Long-form Identifiermindat:1:5:8481144:6
GUID0
Full ReferencePowell, M. J., van Berkel, C., French, I. D., Nicholls, D. H. (1987) Bias dependence of instability mechanisms in amorphous silicon thin‐film transistors. Applied Physics Letters, 51 (16). 1242-1244 doi:10.1063/1.98692
Plain TextPowell, M. J., van Berkel, C., French, I. D., Nicholls, D. H. (1987) Bias dependence of instability mechanisms in amorphous silicon thin‐film transistors. Applied Physics Letters, 51 (16). 1242-1244 doi:10.1063/1.98692
In(1987, October) Applied Physics Letters Vol. 51 (16) AIP Publishing


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