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Shin, S., Agui, A., Harada, Y. (1997) Relaxation Process of the Excited State and Selection Rule in the Soft X-ray Emission of Si and cBN. Journal of Synchrotron Radiation, 4 (4). 256-260 doi:10.1107/s0909049597001143

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Reference TypeJournal (article/letter/editorial)
TitleRelaxation Process of the Excited State and Selection Rule in the Soft X-ray Emission of Si and cBN
JournalJournal of Synchrotron Radiation
AuthorsShin, S.Author
Agui, A.Author
Harada, Y.Author
Year1997 (July 1)Volume4
Issue4
PublisherInternational Union of Crystallography (IUCr)
DOIdoi:10.1107/s0909049597001143Search in ResearchGate
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Mindat Ref. ID8482009Long-form Identifiermindat:1:5:8482009:1
GUID0
Full ReferenceShin, S., Agui, A., Harada, Y. (1997) Relaxation Process of the Excited State and Selection Rule in the Soft X-ray Emission of Si and cBN. Journal of Synchrotron Radiation, 4 (4). 256-260 doi:10.1107/s0909049597001143
Plain TextShin, S., Agui, A., Harada, Y. (1997) Relaxation Process of the Excited State and Selection Rule in the Soft X-ray Emission of Si and cBN. Journal of Synchrotron Radiation, 4 (4). 256-260 doi:10.1107/s0909049597001143
In(1997, July) Journal of Synchrotron Radiation Vol. 4 (4) International Union of Crystallography (IUCr)

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Harada, Y., Ishii, H., Fujisawa, M., Tezuka, Y., Shin, S., Watanabe, M., Kitajima, Y., Yagishita, A. (1998) Spectrometer for polarized soft X-ray Raman scattering. Journal of Synchrotron Radiation, 5 (3). 1013-1015 doi:10.1107/s0909049597019481
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