Humer‐Hager, T., Zwicknagl, P. (1988) Influence of oxygen implantation on the carrier concentration profile inp‐GaAs. Applied Physics Letters, 52 (1). 63-64 doi:10.1063/1.99319
Reference Type | Journal (article/letter/editorial) | ||
---|---|---|---|
Title | Influence of oxygen implantation on the carrier concentration profile inp‐GaAs | ||
Journal | Applied Physics Letters | ||
Authors | Humer‐Hager, T. | Author | |
Zwicknagl, P. | Author | ||
Year | 1988 (January 4) | Volume | 52 |
Issue | 1 | ||
Publisher | AIP Publishing | ||
DOI | doi:10.1063/1.99319Search in ResearchGate | ||
Generate Citation Formats | |||
Mindat Ref. ID | 8482387 | Long-form Identifier | mindat:1:5:8482387:6 |
GUID | 0 | ||
Full Reference | Humer‐Hager, T., Zwicknagl, P. (1988) Influence of oxygen implantation on the carrier concentration profile inp‐GaAs. Applied Physics Letters, 52 (1). 63-64 doi:10.1063/1.99319 | ||
Plain Text | Humer‐Hager, T., Zwicknagl, P. (1988) Influence of oxygen implantation on the carrier concentration profile inp‐GaAs. Applied Physics Letters, 52 (1). 63-64 doi:10.1063/1.99319 | ||
In | (1988, January) Applied Physics Letters Vol. 52 (1) AIP Publishing |
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