Reference Type | Journal (article/letter/editorial) |
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Title | Plasma‐controlled deposition of GaAs and GaAsP by metalorganic chemical vapor deposition |
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Journal | Applied Physics Letters |
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Authors | Huelsman, A. D. | Author |
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Zien, L. | Author |
Reif, R. | Author |
Year | 1988 (February 29) | Volume | 52 |
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Issue | 9 |
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Publisher | AIP Publishing |
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DOI | doi:10.1063/1.99360Search in ResearchGate |
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| Generate Citation Formats |
Mindat Ref. ID | 8483931 | Long-form Identifier | mindat:1:5:8483931:8 |
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GUID | 0 |
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Full Reference | Huelsman, A. D., Zien, L., Reif, R. (1988) Plasma‐controlled deposition of GaAs and GaAsP by metalorganic chemical vapor deposition. Applied Physics Letters, 52 (9). 726-727 doi:10.1063/1.99360 |
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Plain Text | Huelsman, A. D., Zien, L., Reif, R. (1988) Plasma‐controlled deposition of GaAs and GaAsP by metalorganic chemical vapor deposition. Applied Physics Letters, 52 (9). 726-727 doi:10.1063/1.99360 |
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In | (1988, February) Applied Physics Letters Vol. 52 (9) AIP Publishing |
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