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Rudeck, P. J., Harper, J. M. E., Fryer, P. M. (1988) Angular dependence of preferential sputtering and composition in aluminum‐copper thin films. Applied Physics Letters, 53 (10). 845-847 doi:10.1063/1.100090

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Reference TypeJournal (article/letter/editorial)
TitleAngular dependence of preferential sputtering and composition in aluminum‐copper thin films
JournalApplied Physics Letters
AuthorsRudeck, P. J.Author
Harper, J. M. E.Author
Fryer, P. M.Author
Year1988 (September 5)Volume53
Issue10
PublisherAIP Publishing
DOIdoi:10.1063/1.100090Search in ResearchGate
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Mindat Ref. ID8484016Long-form Identifiermindat:1:5:8484016:5
GUID0
Full ReferenceRudeck, P. J., Harper, J. M. E., Fryer, P. M. (1988) Angular dependence of preferential sputtering and composition in aluminum‐copper thin films. Applied Physics Letters, 53 (10). 845-847 doi:10.1063/1.100090
Plain TextRudeck, P. J., Harper, J. M. E., Fryer, P. M. (1988) Angular dependence of preferential sputtering and composition in aluminum‐copper thin films. Applied Physics Letters, 53 (10). 845-847 doi:10.1063/1.100090
In(1988, September) Applied Physics Letters Vol. 53 (10) AIP Publishing

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Face, D. W., Neal, M. J., Matthiesen, M. M., Kucera, J. T., Crain, J., Graybeal, J. M., Orlando, T. P., Rudman, D. A. (1988) Preparation of superconducting thin films of bismuth strontium calcium copper oxides by reactive sputtering. Applied Physics Letters, 53 (3). 246-248 doi:10.1063/1.100589
Gupta, J., Harper, J. M. E., IV, J. L. Mauer, Blauner, P. G., Smith, D. A. (1992) Focused ion beam imaging of grain growth in copper thin films. Applied Physics Letters, 61 (6). 663-665 doi:10.1063/1.107815
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Lee, Y. H., Zhou, Z. H., Danner, D. A., Fryer, P. M., Harper, J. M. (1990) Chemical sputtering of Al2O3by fluorine‐containing plasmas excited by electron cyclotron resonance. Journal of Applied Physics, 68 (10). 5329-5336 doi:10.1063/1.347027
Harper, J. M. E., Charai, A., Stolt, L., d’Heurle, F. M., Fryer, P. M. (1990) Room‐temperature oxidation of silicon catalyzed by Cu3Si. Applied Physics Letters, 56 (25). 2519-2521 doi:10.1063/1.103260
Inam, A., Hegde, M. S., Wu, X. D., Venkatesan, T., England, P., Miceli, P. F., Chase, E. W., Chang, C. C., Tarascon, J. M., Wachtman, J. B. (1988) As‐deposited highTcandJcsuperconducting thin films made at low temperatures. Applied Physics Letters, 53 (10). 908-910 doi:10.1063/1.100155
Shields, P. J., Paget, K. M., Wigen, P. E. (1993) Angular dependence of auto‐oscillations in YIG. Journal of Applied Physics, 73 (10). 6816-6818 doi:10.1063/1.352495
Krumme, J.‐P., Otterloo, A. F., Zalm, P. C., Pertruzzello, J. (1988) Surface segregation and preferential sputtering of bismuth in rf‐magnetron‐sputtered iron‐garnet films. Journal of Applied Physics, 64 (8). 3965-3971 doi:10.1063/1.341354
Fluit, J. M., Rol, P. K., Kistemaker, J. (1963) Angular‐Dependent Sputtering of Copper Single Crystals. Journal of Applied Physics, 34 (3). 690-691 doi:10.1063/1.1729332
Wu, X. M., Wu, P. K., Lu, T.‐M., Rymaszewski, E. J. (1993) Reactive sputtering deposition of low temperature tantalum suboxide thin films. Applied Physics Letters, 62 (25). 3264-3266 doi:10.1063/1.109094
 
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