Richardson, W. B., Mulvaney, B. J. (1988) Plateau and kink in P profiles diffused into Si: A result of strong bimolecular recombination?. Applied Physics Letters, 53 (20). 1917-1919 doi:10.1063/1.100344
Reference Type | Journal (article/letter/editorial) | ||
---|---|---|---|
Title | Plateau and kink in P profiles diffused into Si: A result of strong bimolecular recombination? | ||
Journal | Applied Physics Letters | ||
Authors | Richardson, W. B. | Author | |
Mulvaney, B. J. | Author | ||
Year | 1988 (November 14) | Volume | 53 |
Issue | 20 | ||
Publisher | AIP Publishing | ||
DOI | doi:10.1063/1.100344Search in ResearchGate | ||
Generate Citation Formats | |||
Mindat Ref. ID | 8484820 | Long-form Identifier | mindat:1:5:8484820:0 |
GUID | 0 | ||
Full Reference | Richardson, W. B., Mulvaney, B. J. (1988) Plateau and kink in P profiles diffused into Si: A result of strong bimolecular recombination?. Applied Physics Letters, 53 (20). 1917-1919 doi:10.1063/1.100344 | ||
Plain Text | Richardson, W. B., Mulvaney, B. J. (1988) Plateau and kink in P profiles diffused into Si: A result of strong bimolecular recombination?. Applied Physics Letters, 53 (20). 1917-1919 doi:10.1063/1.100344 | ||
In | (1988, November) Applied Physics Letters Vol. 53 (20) AIP Publishing |
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