Reference Type | Journal (article/letter/editorial) |
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Title | Correlations between deposition parameters and structural and electrical properties of YBa2Cu3O7−δthin films growninsituby sequential ion beam sputtering |
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Journal | Applied Physics Letters |
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Authors | Kittl, J. A. | Author |
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Nieh, C. W. | Author |
Lee, D. S. | Author |
Johnson, W. L. | Author |
Year | 1990 (June 11) | Volume | 56 |
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Issue | 24 |
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Publisher | AIP Publishing |
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DOI | doi:10.1063/1.103258Search in ResearchGate |
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| Generate Citation Formats |
Mindat Ref. ID | 8490711 | Long-form Identifier | mindat:1:5:8490711:4 |
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GUID | 0 |
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Full Reference | Kittl, J. A., Nieh, C. W., Lee, D. S., Johnson, W. L. (1990) Correlations between deposition parameters and structural and electrical properties of YBa2Cu3O7−δthin films growninsituby sequential ion beam sputtering. Applied Physics Letters, 56 (24). 2468-2470 doi:10.1063/1.103258 |
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Plain Text | Kittl, J. A., Nieh, C. W., Lee, D. S., Johnson, W. L. (1990) Correlations between deposition parameters and structural and electrical properties of YBa2Cu3O7−δthin films growninsituby sequential ion beam sputtering. Applied Physics Letters, 56 (24). 2468-2470 doi:10.1063/1.103258 |
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In | (1990, June) Applied Physics Letters Vol. 56 (24) AIP Publishing |
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