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Shirai, Hajime, Das, Debajyoti, Hanna, Jun‐ichi, Shimizu, Isamu (1991) A novel preparation technique for preparing hydrogenated amorphous silicon with a more rigid and stable Si network. Applied Physics Letters, 59 (9). 1096-1098 doi:10.1063/1.106355

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Reference TypeJournal (article/letter/editorial)
TitleA novel preparation technique for preparing hydrogenated amorphous silicon with a more rigid and stable Si network
JournalApplied Physics Letters
AuthorsShirai, HajimeAuthor
Das, DebajyotiAuthor
Hanna, Jun‐ichiAuthor
Shimizu, IsamuAuthor
Year1991 (August 26)Volume59
Issue9
PublisherAIP Publishing
DOIdoi:10.1063/1.106355Search in ResearchGate
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Mindat Ref. ID8497653Long-form Identifiermindat:1:5:8497653:0
GUID0
Full ReferenceShirai, Hajime, Das, Debajyoti, Hanna, Jun‐ichi, Shimizu, Isamu (1991) A novel preparation technique for preparing hydrogenated amorphous silicon with a more rigid and stable Si network. Applied Physics Letters, 59 (9). 1096-1098 doi:10.1063/1.106355
Plain TextShirai, Hajime, Das, Debajyoti, Hanna, Jun‐ichi, Shimizu, Isamu (1991) A novel preparation technique for preparing hydrogenated amorphous silicon with a more rigid and stable Si network. Applied Physics Letters, 59 (9). 1096-1098 doi:10.1063/1.106355
In(1991, August) Applied Physics Letters Vol. 59 (9) AIP Publishing


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