Reference Type | Journal (article/letter/editorial) |
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Title | Characteristics of GaAs, AlGaAs, and InGaAs materials grown by metalorganic chemical vapor deposition using an on‐demand hydride gas generator |
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Journal | Applied Physics Letters |
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Authors | Hummel, S. G. | Author |
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Zou, Y. | Author |
Beyler, C. A. | Author |
Grodzinski, P. | Author |
Dapkus, P. D. | Author |
McManus, J. V. | Author |
Zhang, Y. | Author |
Skromme, B. J. | Author |
Lee, W. I. | Author |
Year | 1992 (March 23) | Volume | 60 |
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Issue | 12 |
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Publisher | AIP Publishing |
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DOI | doi:10.1063/1.107278Search in ResearchGate |
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| Generate Citation Formats |
Mindat Ref. ID | 8497987 | Long-form Identifier | mindat:1:5:8497987:4 |
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|
GUID | 0 |
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Full Reference | Hummel, S. G., Zou, Y., Beyler, C. A., Grodzinski, P., Dapkus, P. D., McManus, J. V., Zhang, Y., Skromme, B. J., Lee, W. I. (1992) Characteristics of GaAs, AlGaAs, and InGaAs materials grown by metalorganic chemical vapor deposition using an on‐demand hydride gas generator. Applied Physics Letters, 60 (12). 1483-1485 doi:10.1063/1.107278 |
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Plain Text | Hummel, S. G., Zou, Y., Beyler, C. A., Grodzinski, P., Dapkus, P. D., McManus, J. V., Zhang, Y., Skromme, B. J., Lee, W. I. (1992) Characteristics of GaAs, AlGaAs, and InGaAs materials grown by metalorganic chemical vapor deposition using an on‐demand hydride gas generator. Applied Physics Letters, 60 (12). 1483-1485 doi:10.1063/1.107278 |
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In | (1992, March) Applied Physics Letters Vol. 60 (12) AIP Publishing |
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