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François, I., Borghs, G. (1994) Postgrowth annealing of YBa2Cu3O7−xthin films in an electron cyclotron resonance oxygen plasma. Applied Physics Letters, 65 (23). 3011-3013 doi:10.1063/1.112492

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Reference TypeJournal (article/letter/editorial)
TitlePostgrowth annealing of YBa2Cu3O7−xthin films in an electron cyclotron resonance oxygen plasma
JournalApplied Physics Letters
AuthorsFrançois, I.Author
Borghs, G.Author
Year1994 (December 5)Volume65
Issue23
PublisherAIP Publishing
DOIdoi:10.1063/1.112492Search in ResearchGate
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Mindat Ref. ID8510588Long-form Identifiermindat:1:5:8510588:3
GUID0
Full ReferenceFrançois, I., Borghs, G. (1994) Postgrowth annealing of YBa2Cu3O7−xthin films in an electron cyclotron resonance oxygen plasma. Applied Physics Letters, 65 (23). 3011-3013 doi:10.1063/1.112492
Plain TextFrançois, I., Borghs, G. (1994) Postgrowth annealing of YBa2Cu3O7−xthin films in an electron cyclotron resonance oxygen plasma. Applied Physics Letters, 65 (23). 3011-3013 doi:10.1063/1.112492
In(1994, December) Applied Physics Letters Vol. 65 (23) AIP Publishing

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Watanabe, Heiji, Matsui, Shinji (1992) Electron‐beam‐assisted dry etching for GaAs using electron cyclotron resonance plasma electron source. Applied Physics Letters, 61 (25). 3011-3013 doi:10.1063/1.107994
Yamamoto, K., Lairson, B. M., Eom, C. B., Hammond, R. H., Bravman, J. C., Geballe, T. H. (1990) Role of atomic oxygen produced by an electron cyclotron resonance plasma in the oxidation of YBa2Cu3O7−xthin films studied byinsituresistivity measurement. Applied Physics Letters, 57 (18). 1936-1938 doi:10.1063/1.104147
Shah, S. I. (1988) Annealing studies of YBa2Cu3O7−xthin films. Applied Physics Letters, 53 (7). 612-614 doi:10.1063/1.100635
Ring, Z., Mantei, T. D., Choo, A. G., Jackson, H. E. (1994) Optimization of diamond growth with statistical experiment design in an electron cyclotron resonance plasma. Applied Physics Letters, 65 (1). 121-123 doi:10.1063/1.113054
Kühle, A., Skov, J. L., Hjorth, S., Rasmussen, I., Hansen, J. Bindslev (1994) Smooth YBa2Cu3O7−xthin films prepared by pulsed laser deposition in O2/Ar atmosphere. Applied Physics Letters, 64 (23). 3178-3180 doi:10.1063/1.111331
Bousetta, A., Lu, M., Bensaoula, A., Schultz, A. (1994) Formation of carbon nitride films on Si(100) substrates by electron cyclotron resonance plasma assisted vapor deposition. Applied Physics Letters, 65 (6). 696-698 doi:10.1063/1.112272
Laviale, D., Oberlin, J. C., Devine, R. A. B. (1994) Low pressure microwave electron cyclotron resonance plasma deposition of amorphous Ta2O5films. Applied Physics Letters, 65 (16). 2021-2023 doi:10.1063/1.112781
Rao, G. Mohan, Krupanidhi, S. B. (1997) Electron cyclotron resonance plasma assisted sputter deposition of boron nitride films. Applied Physics Letters, 70 (5). 628-630 doi:10.1063/1.118332
Shah, S. I., Carcia, P. F. (1987) Superconductivity and resputtering effects in rf sputtered YBa2Cu3O7−xthin films. Applied Physics Letters, 51 (25). 2146-2148 doi:10.1063/1.98975
Pawlowski, C., Aslam, M., Rimai, Lajos (1993) Laser ablation deposition of YBa2Cu3O7−xthin films using a microwave plasma disk reactor oxygen source. Journal of Applied Physics, 74 (10). 6430-6431 doi:10.1063/1.355123
Flemish, J. R., Xie, K., Zhao, J. H. (1994) Smooth etching of single crystal 6H‐SiC in an electron cyclotron resonance plasma reactor. Applied Physics Letters, 64 (17). 2315-2317 doi:10.1063/1.111629
 
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