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Nakano, Hidetoshi, Nishikawa, Tadashi, Uesugi, Naoshi (1998) Strongly enhanced soft x-ray emission at 8 nm from plasma on a neodymium-doped glass surface heated by femtosecond laser pulses. Applied Physics Letters, 72 (18). 2208-2210 doi:10.1063/1.121324

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Reference TypeJournal (article/letter/editorial)
TitleStrongly enhanced soft x-ray emission at 8 nm from plasma on a neodymium-doped glass surface heated by femtosecond laser pulses
JournalApplied Physics Letters
AuthorsNakano, HidetoshiAuthor
Nishikawa, TadashiAuthor
Uesugi, NaoshiAuthor
Year1998 (May 4)Volume72
Issue18
PublisherAIP Publishing
DOIdoi:10.1063/1.121324Search in ResearchGate
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Mindat Ref. ID8520963Long-form Identifiermindat:1:5:8520963:9
GUID0
Full ReferenceNakano, Hidetoshi, Nishikawa, Tadashi, Uesugi, Naoshi (1998) Strongly enhanced soft x-ray emission at 8 nm from plasma on a neodymium-doped glass surface heated by femtosecond laser pulses. Applied Physics Letters, 72 (18). 2208-2210 doi:10.1063/1.121324
Plain TextNakano, Hidetoshi, Nishikawa, Tadashi, Uesugi, Naoshi (1998) Strongly enhanced soft x-ray emission at 8 nm from plasma on a neodymium-doped glass surface heated by femtosecond laser pulses. Applied Physics Letters, 72 (18). 2208-2210 doi:10.1063/1.121324
In(1998, May) Applied Physics Letters Vol. 72 (18) AIP Publishing

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Nakano, Hidetoshi, Nishikawa, Tadashi, Uesugi, Naoshi (2001) Enhanced K-shell x-ray line emissions from aluminum plasma created by a pair of femtosecond laser pulses. Applied Physics Letters, 79 (1). 24-26 doi:10.1063/1.1383571
Nishikawa, Tadashi, Nakano, Hidetoshi, Uesugi, Naoshi, Nakao, Masashi, Masuda, Hideki (1999) Greatly enhanced soft x-ray generation from femtosecond-laser-produced plasma by using a nanohole-alumina target. Applied Physics Letters, 75 (26). 4079-4081 doi:10.1063/1.125542
Nakano, Hidetoshi, Goto, Yoshinori, Lu, Peixiang, Nishikawa, Tadashi, Uesugi, Naoshi (1999) Time-resolved soft x-ray absorption spectroscopy of silicon using femtosecond laser plasma x rays. Applied Physics Letters, 75 (16). 2350-2352 doi:10.1063/1.125011
Oguri, Katsuya, Nakano, Hidetoshi, Nishikawa, Tadashi, Uesugi, Naoshi (2001) Cross-correlation measurement of ultrashort soft x-ray pulse emitted from femtosecond laser-produced plasma using optical field-induced ionization. Applied Physics Letters, 79 (27). 4506-4508 doi:10.1063/1.1430506
Nishikawa, Tadashi, Nakano, Hidetoshi, Oguri, Katsuya, Uesugi, Naoshi, Nishio, Kazuyuki, Masuda, Hideki (2004) Nanohole-array size dependence of soft x-ray generation enhancement from femtosecond-laser-produced plasma. Journal of Applied Physics, 96 (12). 7537-7543 doi:10.1063/1.1814176
Nishikawa, Tadashi, Nakano, Hidetoshi, Ahn, Hyeyoung, Uesugi, Naoshi, Serikawa, Tadashi (1997) X-ray generation enhancement from a laser-produced plasma with a porous silicon target. Applied Physics Letters, 70 (13). 1653-1655 doi:10.1063/1.118660
Nakano, H., Nishikawa, T., Uesugi, N. (1997) Soft x-ray pulse generation from femtosecond laser-produced plasma with reduced debris using a metal-doped glass target. Applied Physics Letters, 70 (1). 16-18 doi:10.1063/1.119289
Okano, Yasuaki, Oguri, Katsuya, Nishikawa, Tadashi, Nakano, Hidetoshi (2006) Spatial distribution of soft x-ray line emissions from aluminum plasma excited by a pair of femtosecond-laser pulses. Journal of Applied Physics, 99 (6). 63302pp. doi:10.1063/1.2180433
Ahn, Hyeyoung, Nakano, Hidetoshi, Nishikawa, Tadashi, Uesugi, Naoshi (1996) Simultaneous Measurement of Absorption and X-Ray Emission from Preformed Plasma Generated by Ultrashort Prepulse. Japanese Journal of Applied Physics, 35. doi:10.1143/jjap.35.l154
Oguri, Katsuya, Okano, Yasuaki, Nishikawa, Tadashi, Nakano, Hidetoshi (2005) Transient observation of extended x-ray absorption fine structure in laser-melted Si by using femtosecond laser-produced-plasma soft x ray. Applied Physics Letters, 87 (1). 11503pp. doi:10.1063/1.1989445
Nakano, H., Nishikawa, T., Ahn, H., Uesugi, N. (1996) Temporal evolution of soft x‐ray pulse emitted from aluminum plasma produced by a pair of Ti:sapphire laser pulses. Applied Physics Letters, 69 (20). 2992-2994 doi:10.1063/1.117754
 
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