| Reference Type | Journal (article/letter/editorial) |
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| Title | In situ observation and correction of resist patterns in atomic force microscope lithography |
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| Journal | Applied Physics Letters |
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| Authors | Shiokawa, Takao | Author |
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| Aoyagi, Yoshinobu | Author |
| Shigeno, Masatsugu | Author |
| Namba, Susumu | Author |
| Year | 1998 (May 11) | Volume | 72 |
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| Issue | 19 |
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| Publisher | AIP Publishing |
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| DOI | doi:10.1063/1.121387Search in ResearchGate |
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| Generate Citation Formats |
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| Mindat Ref. ID | 8521027 | Long-form Identifier | mindat:1:5:8521027:3 |
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|
| GUID | 0 |
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| Full Reference | Shiokawa, Takao, Aoyagi, Yoshinobu, Shigeno, Masatsugu, Namba, Susumu (1998) In situ observation and correction of resist patterns in atomic force microscope lithography. Applied Physics Letters, 72 (19). 2481-2483 doi:10.1063/1.121387 |
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| Plain Text | Shiokawa, Takao, Aoyagi, Yoshinobu, Shigeno, Masatsugu, Namba, Susumu (1998) In situ observation and correction of resist patterns in atomic force microscope lithography. Applied Physics Letters, 72 (19). 2481-2483 doi:10.1063/1.121387 |
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| In | (1998, May) Applied Physics Letters Vol. 72 (19) AIP Publishing |
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