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Kumazawa, Tetsuo, Kumagai, Yukihiro, Miura, Hideo, Kitano, Makoto, Kushida, Keiko (1998) Effect of external stress on polarization in ferroelectric thin films. Applied Physics Letters, 72 (5). 608-610 doi:10.1063/1.120820

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Reference TypeJournal (article/letter/editorial)
TitleEffect of external stress on polarization in ferroelectric thin films
JournalApplied Physics Letters
AuthorsKumazawa, TetsuoAuthor
Kumagai, YukihiroAuthor
Miura, HideoAuthor
Kitano, MakotoAuthor
Kushida, KeikoAuthor
Year1998 (February 2)Volume72
Issue5
PublisherAIP Publishing
DOIdoi:10.1063/1.120820Search in ResearchGate
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Mindat Ref. ID8521524Long-form Identifiermindat:1:5:8521524:1
GUID0
Full ReferenceKumazawa, Tetsuo, Kumagai, Yukihiro, Miura, Hideo, Kitano, Makoto, Kushida, Keiko (1998) Effect of external stress on polarization in ferroelectric thin films. Applied Physics Letters, 72 (5). 608-610 doi:10.1063/1.120820
Plain TextKumazawa, Tetsuo, Kumagai, Yukihiro, Miura, Hideo, Kitano, Makoto, Kushida, Keiko (1998) Effect of external stress on polarization in ferroelectric thin films. Applied Physics Letters, 72 (5). 608-610 doi:10.1063/1.120820
In(1998, February) Applied Physics Letters Vol. 72 (5) AIP Publishing

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Matsui, Yuichi, Hiratani, Masahiko, Kumagai, Yukihiro, Miura, Hideo, Fujisaki, Yoshihisa (1998) Thermal Stability of Pt Bottom Electrodes for Ferroelectric Capacitors. Japanese Journal of Applied Physics, 37. doi:10.1143/jjap.37.l465
Grishin, A. M., Yamazato, M., Yamagata, Y., Ebihara, K. (1998) Structure and polarization in epitaxial ferroelectric PbZr0.52Ti0.48O3/YBa2Cu3O7−x/Nd:YAlO3 thin films. Applied Physics Letters, 72 (5). 620-622 doi:10.1063/1.120824
Miura, Hideo, Ohta, Hiroyuki, Okamoto, Noriaki, Kaga, Toru (1992) Crystallization‐induced stress in silicon thin films. Applied Physics Letters, 60 (22). 2746-2748 doi:10.1063/1.106864
Kushida‐Abdelghafar, Keiko, Miki, Hiroshi, Torii, Kazuyoshi, Fujisaki, Yoshihisa (1996) Electrode‐induced degradation of Pb(ZrxTi1−x)O3 (PZT) polarization hysteresis characteristics in Pt/PZT/Pt ferroelectric thin‐film capacitors. Applied Physics Letters, 69 (21). 3188-3190 doi:10.1063/1.117956
Miura, Hideo, Okamoto, Noriaki (1994) Crystallization‐induced stress in phosphorus‐doped amorphous silicon thin films. Journal of Applied Physics, 75 (9). 4747-4749 doi:10.1063/1.355932
Rossetti, George A., Cross, L. Eric, Kushida, Keiko (1991) Stress induced shift of the Curie point in epitaxial PbTiO3thin films. Applied Physics Letters, 59 (20). 2524-2526 doi:10.1063/1.105940
Du, Xiaofeng, Chen, I-Wei (1998) Model experiments on fatigue of Pb(Zr0.53Ti0.47)O3 ferroelectric thin films. Applied Physics Letters, 72 (15). 1923-1925 doi:10.1063/1.121228
Zheng, Yue, Wang, Biao, Woo, C. H. (2006) Simulation of interface dislocations effect on polarization distribution of ferroelectric thin films. Applied Physics Letters, 88 (9). 92903pp. doi:10.1063/1.2177365
Son, J. Y., Kyhm, K., Cho, J. H. (2006) Surface charge retention and enhanced polarization effect on ferroelectric thin films. Applied Physics Letters, 89 (9). 92907pp. doi:10.1063/1.2339045
Kushida, Keiko, Takeuchi, Hiroshi (1987) Piezoelectricity ofc‐axis oriented PbTiO3thin films. Applied Physics Letters, 50 (25). 1800-1801 doi:10.1063/1.97701
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