Lloyd, J. R. (2001) Comment on “Effect of current crowding on vacancy diffusion and void formation in electromigration” [Appl. Phys. Lett. 76, 988 (2000)]. Applied Physics Letters, 79 (7). 1061-1062 doi:10.1063/1.1386624
Reference Type | Journal (article/letter/editorial) | ||
---|---|---|---|
Title | Comment on “Effect of current crowding on vacancy diffusion and void formation in electromigration” [Appl. Phys. Lett. 76, 988 (2000)] | ||
Journal | Applied Physics Letters | ||
Authors | Lloyd, J. R. | Author | |
Year | 2001 (August 13) | Volume | 79 |
Issue | 7 | ||
Publisher | AIP Publishing | ||
DOI | doi:10.1063/1.1386624Search in ResearchGate | ||
Generate Citation Formats | |||
Mindat Ref. ID | 8531100 | Long-form Identifier | mindat:1:5:8531100:4 |
GUID | 0 | ||
Full Reference | Lloyd, J. R. (2001) Comment on “Effect of current crowding on vacancy diffusion and void formation in electromigration” [Appl. Phys. Lett. 76, 988 (2000)]. Applied Physics Letters, 79 (7). 1061-1062 doi:10.1063/1.1386624 | ||
Plain Text | Lloyd, J. R. (2001) Comment on “Effect of current crowding on vacancy diffusion and void formation in electromigration” [Appl. Phys. Lett. 76, 988 (2000)]. Applied Physics Letters, 79 (7). 1061-1062 doi:10.1063/1.1386624 | ||
In | (2001, August) Applied Physics Letters Vol. 79 (7) AIP Publishing |
See Also
These are possibly similar items as determined by title/reference text matching only.
![]() | |
![]() | |
![]() | |
![]() | |
![]() | |
![]() | |
![]() | |
![]() | |
![]() | |
![]() | |
![]() |