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Tamura, N., MacDowell, A. A., Celestre, R. S., Padmore, H. A., Valek, B., Bravman, J. C., Spolenak, R., Brown, W. L., Marieb, T., Fujimoto, H., Batterman, B. W., Patel, J. R. (2002) High spatial resolution grain orientation and strain mapping in thin films using polychromatic submicron x-ray diffraction. Applied Physics Letters, 80 (20). 3724-3726 doi:10.1063/1.1477621

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Reference TypeJournal (article/letter/editorial)
TitleHigh spatial resolution grain orientation and strain mapping in thin films using polychromatic submicron x-ray diffraction
JournalApplied Physics Letters
AuthorsTamura, N.Author
MacDowell, A. A.Author
Celestre, R. S.Author
Padmore, H. A.Author
Valek, B.Author
Bravman, J. C.Author
Spolenak, R.Author
Brown, W. L.Author
Marieb, T.Author
Fujimoto, H.Author
Batterman, B. W.Author
Patel, J. R.Author
Year2002 (May 20)Volume80
Issue20
PublisherAIP Publishing
DOIdoi:10.1063/1.1477621Search in ResearchGate
Generate Citation Formats
Mindat Ref. ID8532029Long-form Identifiermindat:1:5:8532029:7
GUID0
Full ReferenceTamura, N., MacDowell, A. A., Celestre, R. S., Padmore, H. A., Valek, B., Bravman, J. C., Spolenak, R., Brown, W. L., Marieb, T., Fujimoto, H., Batterman, B. W., Patel, J. R. (2002) High spatial resolution grain orientation and strain mapping in thin films using polychromatic submicron x-ray diffraction. Applied Physics Letters, 80 (20). 3724-3726 doi:10.1063/1.1477621
Plain TextTamura, N., MacDowell, A. A., Celestre, R. S., Padmore, H. A., Valek, B., Bravman, J. C., Spolenak, R., Brown, W. L., Marieb, T., Fujimoto, H., Batterman, B. W., Patel, J. R. (2002) High spatial resolution grain orientation and strain mapping in thin films using polychromatic submicron x-ray diffraction. Applied Physics Letters, 80 (20). 3724-3726 doi:10.1063/1.1477621
In(2002, May) Applied Physics Letters Vol. 80 (20) AIP Publishing

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