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Wong, A. S. W., Chi, D. Z., Loomans, M., Ma, D., Lai, M. Y., Tjiu, W. C., Chua, S. J., Lim, C. W., Greene, J. E. (2002) F-enhanced morphological and thermal stability of NiSi films on BF2+-implanted Si(001). Applied Physics Letters, 81 (27). 5138-5140 doi:10.1063/1.1533856

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Reference TypeJournal (article/letter/editorial)
TitleF-enhanced morphological and thermal stability of NiSi films on BF2+-implanted Si(001)
JournalApplied Physics Letters
AuthorsWong, A. S. W.Author
Chi, D. Z.Author
Loomans, M.Author
Ma, D.Author
Lai, M. Y.Author
Tjiu, W. C.Author
Chua, S. J.Author
Lim, C. W.Author
Greene, J. E.Author
Year2002 (December 30)Volume81
Issue27
PublisherAIP Publishing
DOIdoi:10.1063/1.1533856Search in ResearchGate
Generate Citation Formats
Mindat Ref. ID8534077Long-form Identifiermindat:1:5:8534077:8
GUID0
Full ReferenceWong, A. S. W., Chi, D. Z., Loomans, M., Ma, D., Lai, M. Y., Tjiu, W. C., Chua, S. J., Lim, C. W., Greene, J. E. (2002) F-enhanced morphological and thermal stability of NiSi films on BF2+-implanted Si(001). Applied Physics Letters, 81 (27). 5138-5140 doi:10.1063/1.1533856
Plain TextWong, A. S. W., Chi, D. Z., Loomans, M., Ma, D., Lai, M. Y., Tjiu, W. C., Chua, S. J., Lim, C. W., Greene, J. E. (2002) F-enhanced morphological and thermal stability of NiSi films on BF2+-implanted Si(001). Applied Physics Letters, 81 (27). 5138-5140 doi:10.1063/1.1533856
In(2002, December) Applied Physics Letters Vol. 81 (27) AIP Publishing

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