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Bastos, K. P., Morais, J., Miotti, L., Pezzi, R. P., Soares, G. V., Baumvol, I. J. R., Hegde, R. I., Tseng, H. H., Tobin, P. J. (2002) Oxygen reaction-diffusion in metalorganic chemical vapor deposition HfO2 films annealed in O2. Applied Physics Letters, 81 (9). 1669-1671 doi:10.1063/1.1502006

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Reference TypeJournal (article/letter/editorial)
TitleOxygen reaction-diffusion in metalorganic chemical vapor deposition HfO2 films annealed in O2
JournalApplied Physics Letters
AuthorsBastos, K. P.Author
Morais, J.Author
Miotti, L.Author
Pezzi, R. P.Author
Soares, G. V.Author
Baumvol, I. J. R.Author
Hegde, R. I.Author
Tseng, H. H.Author
Tobin, P. J.Author
Year2002 (August 26)Volume81
Issue9
PublisherAIP Publishing
DOIdoi:10.1063/1.1502006Search in ResearchGate
Generate Citation Formats
Mindat Ref. ID8534489Long-form Identifiermindat:1:5:8534489:9
GUID0
Full ReferenceBastos, K. P., Morais, J., Miotti, L., Pezzi, R. P., Soares, G. V., Baumvol, I. J. R., Hegde, R. I., Tseng, H. H., Tobin, P. J. (2002) Oxygen reaction-diffusion in metalorganic chemical vapor deposition HfO2 films annealed in O2. Applied Physics Letters, 81 (9). 1669-1671 doi:10.1063/1.1502006
Plain TextBastos, K. P., Morais, J., Miotti, L., Pezzi, R. P., Soares, G. V., Baumvol, I. J. R., Hegde, R. I., Tseng, H. H., Tobin, P. J. (2002) Oxygen reaction-diffusion in metalorganic chemical vapor deposition HfO2 films annealed in O2. Applied Physics Letters, 81 (9). 1669-1671 doi:10.1063/1.1502006
In(2002, August) Applied Physics Letters Vol. 81 (9) AIP Publishing

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