Nath, R., Soo, C. W., Boothroyd, C. B., Yeadon, M., Chi, D. Z., Sun, H. P., Chen, Y. B., Pan, X. Q., Foo, Y. L. (2005) NiGe on Ge(001) by reactive deposition epitaxy: An in situ ultrahigh-vacuum transmission-electron microscopy study. Applied Physics Letters, 86 (20). 201908pp. doi:10.1063/1.1929100
Reference Type | Journal (article/letter/editorial) | ||
---|---|---|---|
Title | NiGe on Ge(001) by reactive deposition epitaxy: An in situ ultrahigh-vacuum transmission-electron microscopy study | ||
Journal | Applied Physics Letters | ||
Authors | Nath, R. | Author | |
Soo, C. W. | Author | ||
Boothroyd, C. B. | Author | ||
Yeadon, M. | Author | ||
Chi, D. Z. | Author | ||
Sun, H. P. | Author | ||
Chen, Y. B. | Author | ||
Pan, X. Q. | Author | ||
Foo, Y. L. | Author | ||
Year | 2005 (May 16) | Volume | 86 |
Issue | 20 | ||
Publisher | AIP Publishing | ||
DOI | doi:10.1063/1.1929100Search in ResearchGate | ||
Generate Citation Formats | |||
Mindat Ref. ID | 8542945 | Long-form Identifier | mindat:1:5:8542945:5 |
GUID | 0 | ||
Full Reference | Nath, R., Soo, C. W., Boothroyd, C. B., Yeadon, M., Chi, D. Z., Sun, H. P., Chen, Y. B., Pan, X. Q., Foo, Y. L. (2005) NiGe on Ge(001) by reactive deposition epitaxy: An in situ ultrahigh-vacuum transmission-electron microscopy study. Applied Physics Letters, 86 (20). 201908pp. doi:10.1063/1.1929100 | ||
Plain Text | Nath, R., Soo, C. W., Boothroyd, C. B., Yeadon, M., Chi, D. Z., Sun, H. P., Chen, Y. B., Pan, X. Q., Foo, Y. L. (2005) NiGe on Ge(001) by reactive deposition epitaxy: An in situ ultrahigh-vacuum transmission-electron microscopy study. Applied Physics Letters, 86 (20). 201908pp. doi:10.1063/1.1929100 | ||
In | (2005, May) Applied Physics Letters Vol. 86 (20) AIP Publishing |
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