Watch the Dallas Symposium LIVE, and fundraiser auction
Ticket proceeds support mindat.org! - click here...
Log InRegister
Quick Links : The Mindat ManualThe Rock H. Currier Digital LibraryMindat Newsletter [Free Download]
Home PageAbout MindatThe Mindat ManualHistory of MindatCopyright StatusWho We AreContact UsAdvertise on Mindat
Donate to MindatCorporate SponsorshipSponsor a PageSponsored PagesMindat AdvertisersAdvertise on Mindat
Learning CenterWhat is a mineral?The most common minerals on earthInformation for EducatorsMindat ArticlesThe ElementsThe Rock H. Currier Digital LibraryGeologic Time
Minerals by PropertiesMinerals by ChemistryAdvanced Locality SearchRandom MineralRandom LocalitySearch by minIDLocalities Near MeSearch ArticlesSearch GlossaryMore Search Options
Search For:
Mineral Name:
Locality Name:
Keyword(s):
 
The Mindat ManualAdd a New PhotoRate PhotosLocality Edit ReportCoordinate Completion ReportAdd Glossary Item
Mining CompaniesStatisticsUsersMineral MuseumsClubs & OrganizationsMineral Shows & EventsThe Mindat DirectoryDevice SettingsThe Mineral Quiz
Photo SearchPhoto GalleriesSearch by ColorNew Photos TodayNew Photos YesterdayMembers' Photo GalleriesPast Photo of the Day GalleryPhotography

Naya, M., Tsuruma, I., Tani, T., Mukai, A., Sakaguchi, S., Yasunami, S. (2005) Near-field optical photolithography for high-aspect-ratio patterning using bilayer resist. Applied Physics Letters, 86 (20). 201113pp. doi:10.1063/1.1931056

Advanced
   -   Only viewable:
Reference TypeJournal (article/letter/editorial)
TitleNear-field optical photolithography for high-aspect-ratio patterning using bilayer resist
JournalApplied Physics Letters
AuthorsNaya, M.Author
Tsuruma, I.Author
Tani, T.Author
Mukai, A.Author
Sakaguchi, S.Author
Yasunami, S.Author
Year2005 (May 16)Volume86
Issue20
PublisherAIP Publishing
DOIdoi:10.1063/1.1931056Search in ResearchGate
Generate Citation Formats
Mindat Ref. ID8542961Long-form Identifiermindat:1:5:8542961:3
GUID0
Full ReferenceNaya, M., Tsuruma, I., Tani, T., Mukai, A., Sakaguchi, S., Yasunami, S. (2005) Near-field optical photolithography for high-aspect-ratio patterning using bilayer resist. Applied Physics Letters, 86 (20). 201113pp. doi:10.1063/1.1931056
Plain TextNaya, M., Tsuruma, I., Tani, T., Mukai, A., Sakaguchi, S., Yasunami, S. (2005) Near-field optical photolithography for high-aspect-ratio patterning using bilayer resist. Applied Physics Letters, 86 (20). 201113pp. doi:10.1063/1.1931056
In(2005, May) Applied Physics Letters Vol. 86 (20) AIP Publishing

See Also

These are possibly similar items as determined by title/reference text matching only.

Dechant, A., Dew, S. K., Irvine, S. E., Elezzabi, A. Y. (2005) High-transmission solid-immersion apertured optical probes for near-field scanning optical microscopy. Applied Physics Letters, 86 (1). 13102pp. doi:10.1063/1.1842864
Rogers, John A., Paul, Kateri E., Jackman, Rebecca J., Whitesides, George M. (1997) Using an elastomeric phase mask for sub-100 nm photolithography in the optical near field. Applied Physics Letters, 70 (20). 2658-2660 doi:10.1063/1.118988
Kawashima, H., Furuki, M., Tatsuura, S., Tian, M., Sato, Y., Pu, L. S., Tani, T. (2000) Optical gate action of a molecular thin film probed with femtosecond near-field optical microscopy. Applied Physics Letters, 77 (9). 1283-1285 doi:10.1063/1.1289902
Alkaisi, M. M., Blaikie, R. J., McNab, S. J., Cheung, R., Cumming, D. R. S. (1999) Sub-diffraction-limited patterning using evanescent near-field optical lithography. Applied Physics Letters, 75 (22). 3560-3562 doi:10.1063/1.125388
Gucciardi, P. G., Patanè, S., Ambrosio, A., Allegrini, M., Downes, A. D., Latini, G., Fenwick, O., Cacialli, F. (2005) Observation of tip-to-sample heat transfer in near-field optical microscopy using metal-coated fiber probes. Applied Physics Letters, 86 (20). 203109pp. doi:10.1063/1.1929877
Onuki, T., Tokizaki, T., Watanabe, Y., Tsuchiya, T., Tani, T. (2002) Nanometer-sized optical waveguides fabricated by anodic oxidation using a scanning near-field optical microscope. Applied Physics Letters, 80 (24). 4629-4631 doi:10.1063/1.1486479
Kwon, S.J., Jeong, Y.M., Jeong, S.H. (2006) Fabrication of high-aspect-ratio silicon nanostructures using near-field scanning optical lithography and silicon anisotropic wet-etching process. Applied Physics A, 86. 11-18 doi:10.1007/s00339-006-3744-4
Erickson, Elizabeth S., Dunn, Robert C. (2005) Sample heating in near-field scanning optical microscopy. Applied Physics Letters, 87 (20). 201102pp. doi:10.1063/1.2130388
Usui, T., Mollinger, S. A., Iancu, A. T., Reis, R. M., Prinz, F. B. (2012) High aspect ratio and high breakdown strength metal-oxide capacitors. Applied Physics Letters, 101 (3). 33905pp. doi:10.1063/1.4737641
Khartsev, S. I., Grishin, A. M. (2005) Heteroepitaxial Bi3Fe5O12∕La3Ga5O12 films for magneto-optical photonic crystals. Applied Physics Letters, 86 (14). 141108pp. doi:10.1063/1.1897077
Seo, Jungho, Cho, Hanchul, Lee, Ju-kyung, Lee, Jinyoung, Busnaina, Ahmed, Lee, HeaYeon (2013) Double oxide deposition and etching nanolithography for wafer-scale nanopatterning with high-aspect-ratio using photolithography. Applied Physics Letters, 103 (3). 33105pp. doi:10.1063/1.4813738
 
and/or  
Mindat.org is an outreach project of the Hudson Institute of Mineralogy, a 501(c)(3) not-for-profit organization.
Copyright © mindat.org and the Hudson Institute of Mineralogy 1993-2025, except where stated. Most political location boundaries are © OpenStreetMap contributors. Mindat.org relies on the contributions of thousands of members and supporters. Founded in 2000 by Jolyon Ralph.
To cite: Ralph, J., Von Bargen, D., Martynov, P., Zhang, J., Que, X., Prabhu, A., Morrison, S. M., Li, W., Chen, W., & Ma, X. (2025). Mindat.org: The open access mineralogy database to accelerate data-intensive geoscience research. American Mineralogist, 110(6), 833–844. doi:10.2138/am-2024-9486.
Privacy Policy - Terms & Conditions - Contact Us / DMCA issues - Report a bug/vulnerability Current server date and time: August 20, 2025 02:13:04
Go to top of page